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Том 48, № 4 (2019) Synthesis of a Concurrent Error Detection Circuit Based on the Spectral R-Code with the Partitioning of Outputs into Groups PDF
(Eng)
Stempkovskii A., Tel’pukhov D., Zhukova T., Demeneva A., Nadolenko V., Gurov S.
Том 48, № 4 (2019) Mechanisms of Initiation of Unstable Latchup Effects in CMOS ICs PDF
(Eng)
Chumakov A., Bobrovsky D., Pechenkin A., Savchenkov D., Sorokoumov G., Shvetsov-Shilovskiy I.
Том 48, № 4 (2019) Memristor Based Pulse Train Generator PDF
(Eng)
Rakitin V., Rusakov S.
Том 48, № 4 (2019) Microconsuming 8–12 GHz GaN Power Amplifiers PDF
(Eng)
Gamkrelidze S., Gnatyuk D., Zuev A., Maitama M., Mal’tsev P., Mikhalev A., Fedorov Y.
Том 48, № 4 (2019) Inter-Device Radiation-Induced Leakages in the Bulk 180-nm CMOS Technology PDF
(Eng)
Boruzdina A., Gerasimov Y., Grigor’ev N., Kobylyatskii A., Ulanova A., Shvetsov-Shilovskii I.
Том 48, № 3 (2019) Multilevel Bipolar Memristor Model Considering Deviations of Switching Parameters in the Verilog-A Language PDF
(Eng)
Teplov G., Gornev E.
Том 48, № 3 (2019) Logical C-Element on STG DICE Trigger for Asynchronous Digital Devices Resistant to Single Nuclear Particles PDF
(Eng)
Katunin Y., Stenin V.
Том 48, № 3 (2019) Monte Carlo Simulation of Defects of a Trench Profile in the Process of Deep Reactive Ion Etching of Silicon PDF
(Eng)
Rudenko M., Myakon’kikh A., Lukichev V.
Том 48, № 3 (2019) Methods and Algorithms for the Logical-Topological Design of Microelectronic Circuits at the Valve and Inter-Valve Levels for Promising Technologies with a Vertical Transistor Gate PDF
(Eng)
Ivanova G., Ryzhova D., Gavrilov S., Vasilyev N., Stempkovskii A.
Том 48, № 3 (2019) Layout Synthesis Design Flow for Special-Purpose Reconfigurable Systems-on-a-Chip PDF
(Eng)
Gavrilov S., Zheleznikov D., Zapletina M., Khvatov V., Chochaev R., Enns V.
Том 48, № 3 (2019) Extracting a Logic Gate Network from a Transistor-Level CMOS Circuit PDF
(Eng)
Cheremisinov D., Cheremisinova L.
Том 48, № 3 (2019) Reflection Spectra Modification of Diazoquinone-Novolak Photoresist Implanted with B and P Ions PDF
(Eng)
Brinkevich D., Kharchenko A., Prosolovich V., Odzhaev V., Brinkevich S., Yankovskii Y.
Том 48, № 2 (2019) Effect of the Built-in Surface Potential on the I–V Characteristics of Silicon MIS Structures PDF
(Eng)
Yafarov R.
Том 48, № 2 (2019) Influence of Pulsed Laser Deposition Modes on Properties of Nanocrystalline LiNbO3 Films PDF
(Eng)
Vakulov Z., Varzarev Y., Gusev E., Skrylev A., Panich A., Miakonkikh A., Klemente I., Rudenko K., Konoplev B., Ageev O.
Том 48, № 2 (2019) Nanoscaled Profiling of Silicon Surface via Local Anodic Oxidation PDF
(Eng)
Polyakova V., Kots I., Smirnov V., Ageev O.
Том 48, № 2 (2019) Studying the Regimes of Silicon Surface Profiling by Focused Ion Beams PDF
(Eng)
Kots I., Kolomiitsev A., Lisitsyn S., Polyakova V., Klimin V., Ageev O.
Том 48, № 2 (2019) Formation of Dielectric Nanolayers of Aluminum and Silicon Oxides on AIIIBV Semiconductors PDF
(Eng)
Ezhovskii Y.
Том 48, № 2 (2019) Effect of the Fermi Surface Anisotropy on the Electrical Conductivity of a Thin Inhomogeneous Metal Wire PDF
(Eng)
Kuznetsova I., Romanov D., Yushkanov A.
Том 48, № 2 (2019) Features of the Kinetics of Bulk and Heterogeneous Processes in CHF3 + Ar and C4F8 + Ar Plasma Mixtures PDF
(Eng)
Murin D., Efremov A., Kwon K.
Том 48, № 2 (2019) Studying the Thermodynamic Properties of Composite Magnetic Material Based on Anodic Alumina PDF
(Eng)
Vorobjova A., Shimanovich D., Sycheva O., Ezovitova T., Tishkevich D., Trykhanov A.
Том 48, № 2 (2019) Fabrication and Electrical Characteristics of Asymmetric Rings Made of HTS YBCO Films Obtained by Pulsed Laser Deposition PDF
(Eng)
Il’in A., Ivanov A., Trofimov O., Firsov A., Nikulov A., Zotov A.
Том 48, № 1 (2019) Atomic Layer Deposition of Y2O3 Using Tris(butylcyclopentadienyl)yttrium and Water PDF
(Eng)
Abdulagatov A., Amashaev R., Ashurbekova K., Ramazanov S., Palchaev D., Maksumova A., Rabadanov M., Abdulagatov I.
Том 48, № 1 (2019) Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching PDF
(Eng)
Derevyashkin S., Soboleva E., Shelkovnikov V., Malyshev A., Korolkov V.
Том 48, № 1 (2019) The Effect of Defects with Deep Levels on the CV Characteristics of High-Power AlGaN/GaN/SiC HEMTs PDF
(Eng)
Enisherlova K., Kolkovskii Y., Bobrova E., Temper E., Kapilin S.
Том 48, № 1 (2019) Identification and Excitation Mechanisms of the Lines and Bands of Boron-Containing Components in the Optical Emission Spectra of Low-Temperature BF3/Ar Plasmas PDF
(Eng)
Kudrya V.
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