Email this article Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching
- Authors: Derevyashkin S.V.1,2, Soboleva E.A.1, Shelkovnikov V.V.1,3, Malyshev A.I.4, Korolkov V.P.4
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Affiliations:
- Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
- Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
- Novosibirsk State Technical University
- Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
- Issue: Vol 48, No 1 (2019)
- Pages: 13-27
- Section: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/187076
- DOI: https://doi.org/10.1134/S1063739719010037
- ID: 187076
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Abstract
The masking properties are studied for polymeric structures based on a triacrylamide derivative of polyfluorochalcone at wet etching in aqueous acidic (H2SO4, H3PO4) and alkaline (NaOH) environments, as well as at reactive ion etching (CF4). The kinetic curves are obtained and the etching rates inherent in the photoresists are estimated. A comparison with commercially available photoresists AZ4562 and SU-8 is performed.
About the authors
S. V. Derevyashkin
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
Author for correspondence.
Email: Lilpick69@mail.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630090
E. A. Soboleva
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
Email: Lilpick69@mail.ru
Russian Federation, Novosibirsk, 630090
V. V. Shelkovnikov
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Novosibirsk State Technical University
Email: Lilpick69@mail.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630073
A. I. Malyshev
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Russian Federation, Novosibirsk, 630090
V. P. Korolkov
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Russian Federation, Novosibirsk, 630090
