Мақаланы E-mail арқылы жіберу Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching
- Авторлар: Derevyashkin S.V.1,2, Soboleva E.A.1, Shelkovnikov V.V.1,3, Malyshev A.I.4, Korolkov V.P.4
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Мекемелер:
- Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
- Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
- Novosibirsk State Technical University
- Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
- Шығарылым: Том 48, № 1 (2019)
- Беттер: 13-27
- Бөлім: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/187076
- DOI: https://doi.org/10.1134/S1063739719010037
- ID: 187076
Дәйексөз келтіру
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Рұқсат берілді
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Аннотация
The masking properties are studied for polymeric structures based on a triacrylamide derivative of polyfluorochalcone at wet etching in aqueous acidic (H2SO4, H3PO4) and alkaline (NaOH) environments, as well as at reactive ion etching (CF4). The kinetic curves are obtained and the etching rates inherent in the photoresists are estimated. A comparison with commercially available photoresists AZ4562 and SU-8 is performed.
Авторлар туралы
S. Derevyashkin
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: Lilpick69@mail.ru
Ресей, Novosibirsk, 630090; Novosibirsk, 630090
E. Soboleva
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
Email: Lilpick69@mail.ru
Ресей, Novosibirsk, 630090
V. Shelkovnikov
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Novosibirsk State Technical University
Email: Lilpick69@mail.ru
Ресей, Novosibirsk, 630090; Novosibirsk, 630073
A. Malyshev
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Ресей, Novosibirsk, 630090
V. Korolkov
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Ресей, Novosibirsk, 630090
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