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Effect of Spark Plasma Sintering Temperature on Thermoelectric Properties of Grained Bi1.9Gd0.1Te3 Compound
Yapryntsev M.N., Vasil’ev A.E., Ivanov O.N., Zhezhu M.V.
Application of the Locally Nonequilibrium Diffusion-Drift Cattaneo–Vernotte Model to the Calculation of Photocurrent Relaxation in Diode Structures under Subpicosecond Pulses of Ionizing Radiation
Puzanov A.S., Obolenskiy S.V., Kozlov V.A.
Edge Doping in Graphene Devices on SiO2 Substrates
Vasilyeva G.Y., Smirnov D., Vasilyev Y.B., Greshnov A.A., Haug R.J.
Effect of the Temporal Characteristics of Modulated DC Plasma with the (SiH4–Ar–O2) Gas Phase on ncl-Si Growth in an a-SiOx:H matrix (\({{C}_{{{{{\text{O}}}_{{\text{2}}}}}}}\) = 15.5 mol %)
Undalov Y.K., Terukov E.I., Trapeznikova I.N.
Formation of ncl-Si in the Amorphous Matrix a-SiOx:H Located near the Anode and on the Cathode, Using a Time-Modulated DC Plasma with the (SiH4–Ar–O2) Gas Phase (\({{{\text{C}}}_{{{{{\text{O}}}_{2}}}}}\) = 21.5 mol %)
Undalov Y.K., Terukov E.I., Trapeznikova I.N.
Specific Features of Vapor–Liquid–Solid Nanostructure Growth on the Surface of SnS Films during Plasma Treatment
Zimin S.P., Gorlachev E.S., Mokrov D.A., Amirov I.I., Gremenok V.F., Ivanov V.A.
In-situ Doping of Thermoelectric Materials Based on SiGe Solid Solutions during Their Synthesis by the Spark Plasma Sintering Technique
Dorokhin M.V., Demina P.B., Erofeeva I.V., Zdoroveyshchev A.V., Kuznetsov Y.M., Boldin M.S., Popov A.A., Lantsev E.A., Boryakov A.V.
Study of the surface of GaAs after etching in high-frequency and glow discharge plasma by atomic force microscopy
Dunaev A.V., Murin D.B., Pivovarenok S.A.
Effect of the Plasma Functionalization of Carbon Nanotubes on the Formation of a Carbon Nanotube–Nickel Oxide Composite Electrode Material
Alekseyev A.V., Lebedev E.A., Gavrilin I.M., Kitsuk E.P., Ryazanov R.M., Dudin A.A., Polokhin A.A., Gromov D.G.
Production of Si- and Ge-Based Thermoelectric Materials by Spark Plasma Sintering
Erofeeva I.V., Dorokhin M.V., Zdoroveyshchev A.V., Kuznetsov Y.M., Popov A.A., Lantsev E.A., Boryakov A.V., Kotomina V.E.
Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma
Okhapkin A.I., Yunin P.A., Drozdov M.N., Kraev S.A., Skorokhodov E.V., Shashkin V.I.
Electrical Transport Properties of Nb and Ga Double Substituted Fe2VAl Heusler Compounds
Voronin A.I., Serhiienko I.A., Ashim Y.Z., Kurichenko V.L., Novitskii A.P., Inerbaev T.M., Umetsu R., Khovaylo V.V.
Formation and Properties of Locally Tensile Strained Ge Microstructures for Silicon Photonics
Novikov A.V., Yurasov D.V., Morozova E.E., Skorohodov E.V., Verbus V.A., Yablonskiy A.N., Baidakova N.A., Gusev N.S., Kudryavtsev K.E., Nezhdanov A.V., Mashin A.I.
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