期 |
栏目 |
标题 |
文件 |
卷 52, 编号 7 (2018) |
Fabrication, Treatment, and Testing of Materials and Structures |
Concentric Hexagonal GaN Structures for Nanophotonics, Fabricated by Selective Vapor-Phase Epitaxy with Ion-Beam Etching |
|
卷 52, 编号 10 (2018) |
Fabrication, Treatment, and Testing of Materials and Structures |
Selective Epitaxial Growth of III–N Structures Using Ion-Beam Nanolithography |
|
卷 52, 编号 14 (2018) |
Lasers and Optoelectronic Devices |
Annealing of FIB-Induced Defects in GaAs/AlGaAs Heterostructure |
|
卷 52, 编号 16 (2018) |
26th INTERNATIONAL SYMPOSIUM “NANOSTRUCTURES: PHYSICS AND TECHNOLOGY”. NANOSTRUCTURE TECHNOLOGY |
FIB Lithography Challenges of Si3N4/GaN Mask Preparation for Selective Epitaxy |
|
卷 53, 编号 16 (2019) |
Nanostructures Technology |
Selective Epitaxy of Submicron GaN Structures |
|
卷 53, 编号 16 (2019) |
Nanostructures Technology |
Effect of Annealing on Luminescence of InGaN/GaN Structures Etched by a Focused Ion Beam |
|