Concentric Hexagonal GaN Structures for Nanophotonics, Fabricated by Selective Vapor-Phase Epitaxy with Ion-Beam Etching


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Abstract

In the Si3N4 layer, coaxial and single submicrometer GaN structures of hexagonal shape with pyramidal facets are formed by selective vapor-phase epitaxy in windows produced with a focused ion beam. It is found that coaxial hexagonal structures are formed during the growth process in ring-shaped mask windows.

About the authors

M. I. Mitrofanov

Ioffe Institute; SHM R&E Center

Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 194021

I. V. Levitskii

Ioffe Institute; SHM R&E Center

Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 194021

G. V. Voznyuk

ITMO University

Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 197101

E. E. Tatarinov

ITMO University

Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 197101

S. N. Rodin

Ioffe Institute; SHM R&E Center

Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 194021

M. A. Kaliteevski

Ioffe Institute; ITMO University; St. Petersburg National Research Academic University

Author for correspondence.
Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 197101; St. Petersburg, 194021

V. P. Evtikhiev

St. Petersburg National Research Academic University

Email: Kalit@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021


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