Informaçao sobre o Autor
Okhapkin, A. I.
| Edição | Seção | Título | Arquivo |
| Volume 51, Nº 11 (2017) | XXI International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 13–16, 2017 | Low-temperature deposition of SiNx Films in SiH4/Ar + N2 inductively coupled plasma under high silane dilution with argon | |
| Volume 52, Nº 11 (2018) | Xxii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 12–15, 2018 | Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma | |
| Volume 53, Nº 9 (2019) | Xxiii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 11–14, 2019 | Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond |