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Determination of the Free Charge Carrier Concentration in Boron-Doped Silicon Nanowires Using Attenuated Total Reflection Infrared Spectroscopy
Lipkova E.A., Efimova A.I., Gonchar K.A., Presnov D.E., Eliseev A.A., Lapshin A.N., Timoshenko V.Y.
Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma
Okhapkin A.I., Yunin P.A., Drozdov M.N., Kraev S.A., Skorokhodov E.V., Shashkin V.I.
Formation and Properties of Locally Tensile Strained Ge Microstructures for Silicon Photonics
Novikov A.V., Yurasov D.V., Morozova E.E., Skorohodov E.V., Verbus V.A., Yablonskiy A.N., Baidakova N.A., Gusev N.S., Kudryavtsev K.E., Nezhdanov A.V., Mashin A.I.
Effect of ionic Ag+ transfer on localization of metal-assisted etching of silicon surface
Pyatilova O.V., Sysa A.V., Gavrilov S.A., Yakimova L.V., Pavlov A.A., Belov A.N., Raskin A.A.
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