Formation of Porous Silicon by Nanopowder Sintering


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

The technique of the electrochemical and photoelectrochemical etching of single-crystal silicon wafers commonly used to fabricate macroporous silicon layers is inefficient and costly. An alternative method for forming bulk macroporous silicon is the high-temperature sintering of Si powder. The process of nanopowder sintering preliminarily subjected to dry cold compression (without binding additives) is investigated. The properties of the sintered material, including its microstructure, density, and electrical conductivity, are studied at different annealing temperature and time. Techniques for changing the porosity of the sintered samples and for determining of the interior surface area are discussed.

Авторлар туралы

E. Astrova

Ioffe Institute

Хат алмасуға жауапты Автор.
Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

V. Voronkov

Ioffe Institute

Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

A. Nashchekin

Ioffe Institute

Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

A. Parfeneva

Ioffe Institute

Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

D. Lozhkina

Ioffe Institute

Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

M. Tomkovich

Ioffe Institute

Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

Yu. Kukushkina

Ioffe Institute

Email: east@mail.ioffe.ru
Ресей, St. Petersburg, 194021

Қосымша файлдар

Қосымша файлдар
Әрекет
1. JATS XML

© Pleiades Publishing, Ltd., 2019