Formation of Porous Silicon by Nanopowder Sintering
- Авторы: Astrova E.V.1, Voronkov V.B.1, Nashchekin A.V.1, Parfeneva A.V.1, Lozhkina D.A.1, Tomkovich M.V.1, Kukushkina Y.A.1
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Учреждения:
- Ioffe Institute
- Выпуск: Том 53, № 4 (2019)
- Страницы: 530-539
- Раздел: Physics of Semiconductor Devices
- URL: https://journals.rcsi.science/1063-7826/article/view/205991
- DOI: https://doi.org/10.1134/S1063782619040031
- ID: 205991
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Аннотация
The technique of the electrochemical and photoelectrochemical etching of single-crystal silicon wafers commonly used to fabricate macroporous silicon layers is inefficient and costly. An alternative method for forming bulk macroporous silicon is the high-temperature sintering of Si powder. The process of nanopowder sintering preliminarily subjected to dry cold compression (without binding additives) is investigated. The properties of the sintered material, including its microstructure, density, and electrical conductivity, are studied at different annealing temperature and time. Techniques for changing the porosity of the sintered samples and for determining of the interior surface area are discussed.
Об авторах
E. Astrova
Ioffe Institute
Автор, ответственный за переписку.
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
V. Voronkov
Ioffe Institute
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
A. Nashchekin
Ioffe Institute
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
A. Parfeneva
Ioffe Institute
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
D. Lozhkina
Ioffe Institute
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
M. Tomkovich
Ioffe Institute
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
Yu. Kukushkina
Ioffe Institute
Email: east@mail.ioffe.ru
Россия, St. Petersburg, 194021
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