Study of the structure and composition of the strained epitaxial layer in the InAlAs/GaAs(100) heterostructure by transmission electron microscopy
- 作者: Lovygin M.V.1, Borgardt N.I.1, Bugaev A.S.2, Volkov R.L.1, Seibt M.3
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隶属关系:
- National Research University of Electronic Technology MIET
- Institute of Ultrahigh-Frequency Semiconductor Electronics
- IV Physical Institute
- 期: 卷 50, 编号 13 (2016)
- 页面: 1753-1758
- 栏目: Methods and Technique of Measurements
- URL: https://journals.rcsi.science/1063-7826/article/view/199249
- DOI: https://doi.org/10.1134/S1063782616130066
- ID: 199249
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详细
The results of electron microscopy studies of an epitaxial InAlAs layer on a GaAs(100) substrate are reported. It is established that there exist misfit dislocations at the interface between the materials and there are residual strains distorting the lattice in the layer. From the measurements of lattice parameters in the directions parallel and orthogonal to the growth direction away from misfit dislocations, the local nominal lattice parameter of the layer is calculated and the relative content of indium is determined.
作者简介
M. Lovygin
National Research University of Electronic Technology MIET
编辑信件的主要联系方式.
Email: lemi@miee.ru
俄罗斯联邦, Zelenograd, Moscow, 124498
N. Borgardt
National Research University of Electronic Technology MIET
Email: lemi@miee.ru
俄罗斯联邦, Zelenograd, Moscow, 124498
A. Bugaev
Institute of Ultrahigh-Frequency Semiconductor Electronics
Email: lemi@miee.ru
俄罗斯联邦, Moscow, 117105
R. Volkov
National Research University of Electronic Technology MIET
Email: lemi@miee.ru
俄罗斯联邦, Zelenograd, Moscow, 124498
M. Seibt
IV Physical Institute
Email: lemi@miee.ru
德国, Gottingen, D-37077
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