Study of the structure and composition of the strained epitaxial layer in the InAlAs/GaAs(100) heterostructure by transmission electron microscopy


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Abstract

The results of electron microscopy studies of an epitaxial InAlAs layer on a GaAs(100) substrate are reported. It is established that there exist misfit dislocations at the interface between the materials and there are residual strains distorting the lattice in the layer. From the measurements of lattice parameters in the directions parallel and orthogonal to the growth direction away from misfit dislocations, the local nominal lattice parameter of the layer is calculated and the relative content of indium is determined.

About the authors

M. V. Lovygin

National Research University of Electronic Technology MIET

Author for correspondence.
Email: lemi@miee.ru
Russian Federation, Zelenograd, Moscow, 124498

N. I. Borgardt

National Research University of Electronic Technology MIET

Email: lemi@miee.ru
Russian Federation, Zelenograd, Moscow, 124498

A. S. Bugaev

Institute of Ultrahigh-Frequency Semiconductor Electronics

Email: lemi@miee.ru
Russian Federation, Moscow, 117105

R. L. Volkov

National Research University of Electronic Technology MIET

Email: lemi@miee.ru
Russian Federation, Zelenograd, Moscow, 124498

M. Seibt

IV Physical Institute

Email: lemi@miee.ru
Germany, Gottingen, D-37077


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