Study of the structure and composition of the strained epitaxial layer in the InAlAs/GaAs(100) heterostructure by transmission electron microscopy


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Resumo

The results of electron microscopy studies of an epitaxial InAlAs layer on a GaAs(100) substrate are reported. It is established that there exist misfit dislocations at the interface between the materials and there are residual strains distorting the lattice in the layer. From the measurements of lattice parameters in the directions parallel and orthogonal to the growth direction away from misfit dislocations, the local nominal lattice parameter of the layer is calculated and the relative content of indium is determined.

Sobre autores

M. Lovygin

National Research University of Electronic Technology MIET

Autor responsável pela correspondência
Email: lemi@miee.ru
Rússia, Zelenograd, Moscow, 124498

N. Borgardt

National Research University of Electronic Technology MIET

Email: lemi@miee.ru
Rússia, Zelenograd, Moscow, 124498

A. Bugaev

Institute of Ultrahigh-Frequency Semiconductor Electronics

Email: lemi@miee.ru
Rússia, Moscow, 117105

R. Volkov

National Research University of Electronic Technology MIET

Email: lemi@miee.ru
Rússia, Zelenograd, Moscow, 124498

M. Seibt

IV Physical Institute

Email: lemi@miee.ru
Alemanha, Gottingen, D-37077


Declaração de direitos autorais © Pleiades Publishing, Ltd., 2016

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