期 |
栏目 |
标题 |
文件 |
卷 51, 编号 3 (2017) |
Physics of Semiconductor Devices |
AlN/GaN heterostructures for normally-off transistors |
|
卷 52, 编号 2 (2018) |
Microcrystalline, Nanocrystalline, Porous, and Composite Semiconductors |
Change in the Character of Biaxial Stresses with an Increase in x from 0 to 0.7 in AlxGa1 – xN:Si Layers Obtained by Ammonia Molecular Beam Epitaxy |
|
卷 52, 编号 6 (2018) |
Fabrication, Treatment, and Testing of Materials and Structures |
Effect of the Sapphire-Nitridation Level and Nucleation-Layer Enrichment with Aluminum on the Structural Properties of AlN Layers |
|
卷 52, 编号 12 (2018) |
Xxii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 12–15, 2018 |
Formation of a Graphene-Like SiN Layer on the Surface Si(111) |
|