作者的详细信息

Goloshchapov, D. L.

栏目 标题 文件
卷 50, 编号 9 (2016) Fabrication, Treatment, and Testing of Materials and Structures Growth features and spectroscopic structure investigations of nanoprofiled AlN films formed on misoriented GaAs substrates
卷 51, 编号 9 (2017) Electronic Properties of Semiconductors Experimental studies of the effects of atomic ordering in epitaxial GaxIn1 – xP alloys on their optical properties
卷 52, 编号 8 (2018) Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena Effect of Misorientation and Preliminary Etching of the Substrate on the Structural and Optical Properties of Integrated GaAs/Si(100) Heterostructures Produced by Vapor Phase Epitaxy
卷 52, 编号 9 (2018) Microcrystalline, Nanocrystalline, Porous, and Composite Semiconductors Effect of Conditions of Electrochemical Etching on the Morphological, Structural, and Optical Properties of Porous Gallium Arsenide
卷 52, 编号 13 (2018) Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) Effect of a por-Si Buffer Layer on the Structure and Morphology of Epitaxial InxGa1 – xN/Si(111) Heterostructures
卷 53, 编号 1 (2019) Microcrystalline, Nanocrystalline, Porous, and Composite Semiconductors Influence of a por-Si Buffer Layer on the Optical Properties of Epitaxial InxGa1 –xN/Si(111) Heterostructures with a Nanocolumnar Film Morphology
卷 53, 编号 7 (2019) Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena On the Morphology and Optical Properties of Molybdenum Disulfide Nanostructures from a Monomolecular Layer to a Fractal-Like Substructure
卷 53, 编号 7 (2019) Fabrication, Treatment, and Testing of Materials and Structures Investigation into the Influence of a Buffer Layer of Nanoporous Silicon on the Atomic and Electronic Structure and Optical Properties of AIIIN/por-Si Heterostructures Grown by Plasma-Activated Molecular-Beam Epitaxy
卷 53, 编号 8 (2019) Fabrication, Treatment, and Testing of Materials and Structures Structural and Morphological Properties of Hybrid Heterostructures Based on GaN Grown on a Compliant por-Si(111) Substrate
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