Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films
- Autores: Krylov P.1, Alalykin A.1, Durman E.1, Zakirova R.1, Fedotova I.1
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Afiliações:
- Udmurt State University
- Edição: Volume 53, Nº 11 (2019)
- Páginas: 1457-1464
- Seção: Surfaces, Interfaces, and Thin Films
- URL: https://journals.rcsi.science/1063-7826/article/view/207272
- DOI: https://doi.org/10.1134/S1063782619110095
- ID: 207272
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Resumo
The effect of ion-beam processing alternating with magnetron sputtering on the properties of zinc-oxide thin films is investigated. It is shown that ion-beam processing reduces the growth rate, coherent-scattering-region sizes, and the resistivity. The stoichiometric index, band gap, and refractive index increase. The transparency of the films in the weak absorption region remains unchanged.
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Sobre autores
P. Krylov
Udmurt State University
Autor responsável pela correspondência
Email: ftt@udsu.ru
Rússia, Izhevsk, 426034
A. Alalykin
Udmurt State University
Email: ftt@udsu.ru
Rússia, Izhevsk, 426034
E. Durman
Udmurt State University
Email: ftt@udsu.ru
Rússia, Izhevsk, 426034
R. Zakirova
Udmurt State University
Email: ftt@udsu.ru
Rússia, Izhevsk, 426034
I. Fedotova
Udmurt State University
Email: ftt@udsu.ru
Rússia, Izhevsk, 426034