Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films

P. N. Krylov; A. S. Alalykin; E. A. Durman; R. M. Zakirova; I. V. Fedotova

doi:10.1134/S1063782619110095

Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films

作者: Krylov P.¹, Alalykin A.¹, Durman E.¹, Zakirova R.¹, Fedotova I.¹
隶属关系:
1. Udmurt State University
期: 卷 53, 编号 11 (2019)
页面: 1457-1464
栏目: Surfaces, Interfaces, and Thin Films
URL: https://journals.rcsi.science/1063-7826/article/view/207272
DOI: https://doi.org/10.1134/S1063782619110095
ID: 207272

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详细

The effect of ion-beam processing alternating with magnetron sputtering on the properties of zinc-oxide thin films is investigated. It is shown that ion-beam processing reduces the growth rate, coherent-scattering-region sizes, and the resistivity. The stoichiometric index, band gap, and refractive index increase. The transparency of the films in the weak absorption region remains unchanged.