Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films
- Authors: Krylov P.N.1, Alalykin A.S.1, Durman E.A.1, Zakirova R.M.1, Fedotova I.V.1
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Affiliations:
- Udmurt State University
- Issue: Vol 53, No 11 (2019)
- Pages: 1457-1464
- Section: Surfaces, Interfaces, and Thin Films
- URL: https://journals.rcsi.science/1063-7826/article/view/207272
- DOI: https://doi.org/10.1134/S1063782619110095
- ID: 207272
Cite item
Abstract
The effect of ion-beam processing alternating with magnetron sputtering on the properties of zinc-oxide thin films is investigated. It is shown that ion-beam processing reduces the growth rate, coherent-scattering-region sizes, and the resistivity. The stoichiometric index, band gap, and refractive index increase. The transparency of the films in the weak absorption region remains unchanged.
Keywords
About the authors
P. N. Krylov
Udmurt State University
Author for correspondence.
Email: ftt@udsu.ru
Russian Federation, Izhevsk, 426034
A. S. Alalykin
Udmurt State University
Email: ftt@udsu.ru
Russian Federation, Izhevsk, 426034
E. A. Durman
Udmurt State University
Email: ftt@udsu.ru
Russian Federation, Izhevsk, 426034
R. M. Zakirova
Udmurt State University
Email: ftt@udsu.ru
Russian Federation, Izhevsk, 426034
I. V. Fedotova
Udmurt State University
Email: ftt@udsu.ru
Russian Federation, Izhevsk, 426034