Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films

P. N. Krylov; A. S. Alalykin; E. A. Durman; R. M. Zakirova; I. V. Fedotova

doi:10.1134/S1063782619110095

Effect of Ion-Beam Processing during RF Magnetron Sputtering on the properties of ZnO Films

Авторы: Krylov P.¹, Alalykin A.¹, Durman E.¹, Zakirova R.¹, Fedotova I.¹
Учреждения:
1. Udmurt State University
Выпуск: Том 53, № 11 (2019)
Страницы: 1457-1464
Раздел: Surfaces, Interfaces, and Thin Films
URL: https://journals.rcsi.science/1063-7826/article/view/207272
DOI: https://doi.org/10.1134/S1063782619110095
ID: 207272

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Аннотация

The effect of ion-beam processing alternating with magnetron sputtering on the properties of zinc-oxide thin films is investigated. It is shown that ion-beam processing reduces the growth rate, coherent-scattering-region sizes, and the resistivity. The stoichiometric index, band gap, and refractive index increase. The transparency of the films in the weak absorption region remains unchanged.