Effect of the Electric Mode and γ Irradiation on Surface-Defect Formation at the Si–SiO 2  Interface in a MOS Transistor

N. A. Kulikov; V. D. Popov

doi:10.1134/S1063782619010123

Effect of the Electric Mode and γ Irradiation on Surface-Defect Formation at the Si–SiO₂ Interface in a MOS Transistor

Autores: Kulikov N.¹, Popov V.¹
Afiliações:
1. National Research Nuclear University “Moscow Engineering Physics Institute”
Edição: Volume 53, Nº 1 (2019)
Páginas: 110-113
Seção: Physics of Semiconductor Devices
URL: https://journals.rcsi.science/1063-7826/article/view/205629
DOI: https://doi.org/10.1134/S1063782619010123
ID: 205629

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Resumo

The results of experimental investigation into surface-defect formation under the effect of gamma-radiation with a dose rate P = 0.1 rad(Si)/s on MOS (metal-oxide-semiconductor) transistors with the n-type channel in the passive and active modes are presented. Two stages of surface-defect formation are observed. A qualitative model is proposed to explain the effect of the the drain transistor voltage on the defect formation process.

Sobre autores

N. Kulikov

National Research Nuclear University “Moscow Engineering Physics Institute”

Email: wdpopov@mail.ru
Rússia, Moscow, 115409

V. Popov