High-Sensitivity Photodetector Based on Atomically Thin MoS2


Cite item

Full Text

Open Access Open Access
Restricted Access Access granted
Restricted Access Subscription Access

Abstract

A design for a high-sensitivity photodetector with a single layer of MoS2 transition-metal dichalcogenide used as the basic functional element is proposed and the process of its fabrication is presented step by step. Quality evaluation and the selection of functional MoS2 flakes is based on the results of combined optical characterization. The main operating characteristics of the fabricated device are investigated and a photosensitivity of 1.4 mA/W is demonstrated. A difference of this device in comparison with existing analogues is its high photosensitivity at low operating voltages (in the range of ±3 V).

About the authors

S. D. Lavrov

Moscow Technological University (MIREA)

Author for correspondence.
Email: sdlavrov@mail.ru
Russian Federation, Moscow, 119454

A. P. Shestakova

Moscow Technological University (MIREA)

Email: sdlavrov@mail.ru
Russian Federation, Moscow, 119454

E. D. Mishina

Moscow Technological University (MIREA)

Email: sdlavrov@mail.ru
Russian Federation, Moscow, 119454

Yu. R. Efimenkov

NPP Pulsar

Email: sdlavrov@mail.ru
Russian Federation, Moscow, 105187

A. S. Sigov

Moscow Technological University (MIREA)

Email: sdlavrov@mail.ru
Russian Federation, Moscow, 119454


Copyright (c) 2018 Pleiades Publishing, Ltd.

This website uses cookies

You consent to our cookies if you continue to use our website.

About Cookies