Email this article Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
- Authors: Demidov E.V.1, Komarov V.A.1, Krushelnitckii A.N.1, Suslov A.V.1
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Affiliations:
- Herzen State Pedagogical University of Russia
- Issue: Vol 51, No 7 (2017)
- Pages: 840-842
- Section: XV International Conference “Thermoelectrics and Their Applications—2016”, St. Petersburg, November 15–16, 2016
- URL: https://journals.rcsi.science/1063-7826/article/view/200145
- DOI: https://doi.org/10.1134/S1063782617070065
- ID: 200145
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Abstract
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
About the authors
E. V. Demidov
Herzen State Pedagogical University of Russia
Author for correspondence.
Email: demidov_evg@mail.ru
Russian Federation, St. Petersburg, 191186
V. A. Komarov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Russian Federation, St. Petersburg, 191186
A. N. Krushelnitckii
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Russian Federation, St. Petersburg, 191186
A. V. Suslov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Russian Federation, St. Petersburg, 191186
