Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
- Авторы: Demidov E.V.1, Komarov V.A.1, Krushelnitckii A.N.1, Suslov A.V.1
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Учреждения:
- Herzen State Pedagogical University of Russia
- Выпуск: Том 51, № 7 (2017)
- Страницы: 840-842
- Раздел: XV International Conference “Thermoelectrics and Their Applications—2016”, St. Petersburg, November 15–16, 2016
- URL: https://journals.rcsi.science/1063-7826/article/view/200145
- DOI: https://doi.org/10.1134/S1063782617070065
- ID: 200145
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Аннотация
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
Об авторах
E. Demidov
Herzen State Pedagogical University of Russia
Автор, ответственный за переписку.
Email: demidov_evg@mail.ru
Россия, St. Petersburg, 191186
V. Komarov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Россия, St. Petersburg, 191186
A. Krushelnitckii
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Россия, St. Petersburg, 191186
A. Suslov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Россия, St. Petersburg, 191186
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