电邮这篇文章 Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
- 作者: Demidov E.1, Komarov V.1, Krushelnitckii A.1, Suslov A.1
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隶属关系:
- Herzen State Pedagogical University of Russia
- 期: 卷 51, 编号 7 (2017)
- 页面: 840-842
- 栏目: XV International Conference “Thermoelectrics and Their Applications—2016”, St. Petersburg, November 15–16, 2016
- URL: https://journals.rcsi.science/1063-7826/article/view/200145
- DOI: https://doi.org/10.1134/S1063782617070065
- ID: 200145
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详细
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
作者简介
E. Demidov
Herzen State Pedagogical University of Russia
编辑信件的主要联系方式.
Email: demidov_evg@mail.ru
俄罗斯联邦, St. Petersburg, 191186
V. Komarov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
俄罗斯联邦, St. Petersburg, 191186
A. Krushelnitckii
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
俄罗斯联邦, St. Petersburg, 191186
A. Suslov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
俄罗斯联邦, St. Petersburg, 191186
