Transport of hot charge carriers in Si, GaAs, InGaAs, and GaN submicrometer semiconductor structures with nanometer-scale clusters of radiation-induced defects


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详细

The distributions of the radii of subclusters of radiation-induced defects and of the distances between the cores of these subclusters are calculated for Si, GaAs, and GaN. The features of the transport of hot charge carriers in the above materials upon irradiation with neutrons are discussed. A burst in the velocity of electrons in Si, GaAs, InGaAs, and GaN before and after irradiation is calculated for the first time; also, the extent of manifestation of the above effect in different semiconductor materials is compared.

作者简介

I. Zabavichev

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
俄罗斯联邦, Nizhny Novgorod, 603950

E. Obolenskaya

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
俄罗斯联邦, Nizhny Novgorod, 603950

A. Potekhin

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
俄罗斯联邦, Nizhny Novgorod, 603950

A. Puzanov

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
俄罗斯联邦, Nizhny Novgorod, 603950

S. Obolensky

Lobachevsky State University of Nizhny Novgorod

编辑信件的主要联系方式.
Email: obolensk@rf.unn.ru
俄罗斯联邦, Nizhny Novgorod, 603950

V. Kozlov

Lobachevsky State University of Nizhny Novgorod; Institute for Physics of Microstructures

Email: obolensk@rf.unn.ru
俄罗斯联邦, Nizhny Novgorod, 603950; Nizhny Novgorod, 607680


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