Impact ionization in nonuniformly heated silicon p+–n–n+ and n+–p–p+ structures
- 作者: Musaev A.M.1
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隶属关系:
- Amirkhanov Institute of Physics, Dagestan Scientific Center
- 期: 卷 50, 编号 4 (2016)
- 页面: 462-465
- 栏目: Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena
- URL: https://journals.rcsi.science/1063-7826/article/view/196976
- DOI: https://doi.org/10.1134/S1063782616040175
- ID: 196976
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详细
Experimental results on the effects of changes in the impact-ionization current in silicon diffusion p+–n–n+ and n+–p–p+ structures upon nonuniform heating are presented. It is shown that the revealed effects are associated with the transformation of band energy levels caused by thermoelastic stresses of the structures.
作者简介
A. Musaev
Amirkhanov Institute of Physics, Dagestan Scientific Center
编辑信件的主要联系方式.
Email: akhmed-musaev@yandex.ru
俄罗斯联邦, ul. Yaragskogo 94, Makhachkala, 367003
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