Changes in the Photoluminescence Properties of Semiconductor Heterostructures after Ion-Beam Etching
- Autores: Levitskii Y.1, Mitrofanov M.1, Voznyuk G.1, Nikolayev D.1, Mizerov M.1, Evtikhiev V.1
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Afiliações:
- Ioffe Institute
- Edição: Volume 53, Nº 11 (2019)
- Páginas: 1545-1549
- Seção: Fabrication, Treatment, and Testing of Materials and Structures
- URL: https://journals.rcsi.science/1063-7826/article/view/207330
- DOI: https://doi.org/10.1134/S1063782619110101
- ID: 207330
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Resumo
The ion-beam etching of AlGaAs/GaAs heterostructures gives rise to radiation defects and, as a result, leads to photoluminescence quenching. Annealing at 620°C in an atmosphere of As almost completely restores the quantum efficiency of photoluminescence in the case of radiation-induced defects lying at a distance of up to 150 nm from the heterointerface.
Sobre autores
Ya. Levitskii
Ioffe Institute
Email: Evtikhiev@mail.ioffe.ru
Rússia, St. Petersburg, 194021
M. Mitrofanov
Ioffe Institute
Email: Evtikhiev@mail.ioffe.ru
Rússia, St. Petersburg, 194021
G. Voznyuk
Ioffe Institute
Email: Evtikhiev@mail.ioffe.ru
Rússia, St. Petersburg, 194021
D. Nikolayev
Ioffe Institute
Email: Evtikhiev@mail.ioffe.ru
Rússia, St. Petersburg, 194021
M. Mizerov
Ioffe Institute
Email: Evtikhiev@mail.ioffe.ru
Rússia, St. Petersburg, 194021
V. Evtikhiev
Ioffe Institute
Autor responsável pela correspondência
Email: Evtikhiev@mail.ioffe.ru
Rússia, St. Petersburg, 194021