Ultrathin Barrier InAlN/GaN Heterostructures for HEMTs
- Autores: Sakharov A.1, Kurbanova N.2, Demchenko O.2, Sim P.2, Yagovkina M.1, Tsatsulnikov A.3, Usov S.3, Zakheim D.1, Zavarin E.1, Lundin W.1, Velikovskiy L.2
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Afiliações:
- Ioffe Institute
- Tomsk State University
- Submicron Heterostructures for Microelectronics, Research and Engineering Center, Russian Academy of Sciences
- Edição: Volume 52, Nº 14 (2018)
- Páginas: 1843-1845
- Seção: Nanostructure Devices
- URL: https://journals.rcsi.science/1063-7826/article/view/205045
- DOI: https://doi.org/10.1134/S1063782618140257
- ID: 205045
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Resumo
InAlN/AlN/GaN semiconductor heterostructures with a barrier thickness of 5–13 nm have been grown by metalorganic vapor phase epitaxy (MOVPE) on sapphire and SiC substrates. Optimization of GaN buffer and InAlN layers allows fabricating structures with sheet conductivity values below 210 Ohm/sq. High electron mobility transistors (HEMTs) fabricated from such structures show drain current value exceeding 1.25 A/mm with maximum transconductance of 450 mS/mm. Use of thin in situ Si3N4 capping allows to fabricate and compare HEMT and MIS-HEMTs.
Sobre autores
A. Sakharov
Ioffe Institute
Autor responsável pela correspondência
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
N. Kurbanova
Tomsk State University
Email: val.beam@mail.ioffe.ru
Rússia, Tomsk
O. Demchenko
Tomsk State University
Email: val.beam@mail.ioffe.ru
Rússia, Tomsk
P. Sim
Tomsk State University
Email: val.beam@mail.ioffe.ru
Rússia, Tomsk
M. Yagovkina
Ioffe Institute
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
A. Tsatsulnikov
Submicron Heterostructures for Microelectronics, Research and Engineering Center, Russian Academy of Sciences
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
S. Usov
Submicron Heterostructures for Microelectronics, Research and Engineering Center, Russian Academy of Sciences
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
D. Zakheim
Ioffe Institute
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
E. Zavarin
Ioffe Institute
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
W. Lundin
Ioffe Institute
Email: val.beam@mail.ioffe.ru
Rússia, St. Petersburg
L. Velikovskiy
Tomsk State University
Email: val.beam@mail.ioffe.ru
Rússia, Tomsk