Defect Formation under Nitrogen-Ion Implantation and Subsequent Annealing in GaAs Structures with an Uncovered Surface and a Surface Covered with an AlN Film
- Authors: Sobolev N.A.1, Sakharov V.I.1, Serenkov I.T.1, Bondarev A.D.1, Karabeshkin K.V.1, Fomin E.V.1, Kalyadin A.E.1, Mikoushkin V.M.1, Shek E.I.1, Sherstnev E.V.1
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Affiliations:
- Ioffe Institute
- Issue: Vol 53, No 4 (2019)
- Pages: 415-418
- Section: Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion)
- URL: https://journals.rcsi.science/1063-7826/article/view/205912
- DOI: https://doi.org/10.1134/S1063782619040250
- ID: 205912
Cite item
Abstract
The concentration profiles of defects produced in structures upon the implantation of nitrogen ions into GaAs epitaxial layers with an uncovered surface and that covered with an AlN film and subsequent annealing are studied. The ion energies and the implantation doses are chosen so that the nitrogen-atom concentration profiles coincided in structures of both types. Rutherford proton backscattering spectra are measured in the random and channeling modes, and the concentration profiles of point defects formed are calculated for the samples under study. It is found that the implantation of nitrogen ions introduces nearly the same number of point defects into structures of both types, and the formation of an AlN film by ion-plasma sputtering is accompanied by the formation of an additional number of defects. However, the annealing of structures of both types leads to nearly the same concentrations of residual defects.
About the authors
N. A. Sobolev
Ioffe Institute
Author for correspondence.
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
V. I. Sakharov
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
I. T. Serenkov
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
A. D. Bondarev
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
K. V. Karabeshkin
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
E. V. Fomin
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
A. E. Kalyadin
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
V. M. Mikoushkin
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
E. I. Shek
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
E. V. Sherstnev
Ioffe Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021