MBE Growth and Structural Properties of GaP and InP Nanowires on a SiC Substrate with a Graphene Layer


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Abstract

The possibility in principle of the MBE (molecular-beam epitaxy) growth of GaP and InP nanowires on a SiC substrate with a graphene layer is demonstrated for the first time. InP nanowires on such a substrate have no stacking faults and possess an ideal crystallographic quality. At the same time, GaP nanowires have structural defects of the type of twins and the reversal of crystallographic phases at the top and at the base. The results of structural measurements demonstrate that the nanowires are formed in the wurtzite phase, which is not typical of bulk III–V materials.

About the authors

P. A. Alexeev

Ioffe Institute

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021

G. E. Cirlin

ITMO University; St. Petersburg Academic University, Russian Academy of Sciences; Institute for Analytical Instrumentation, Russian Academy of Sciences; Peter the Great St. Petersburg Polytechnic University

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 197101; St. Petersburg, 194021; St. Petersburg, 190103; St. Petersburg, 195251

R. R. Reznik

ITMO University

Author for correspondence.
Email: moment92@mail.ru
Russian Federation, St. Petersburg, 197101

K. P. Kotlyar

St. Petersburg Academic University, Russian Academy of Sciences

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021

I. V. Ilkiv

St. Petersburg Academic University, Russian Academy of Sciences

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021

I. P. Soshnikov

St. Petersburg Academic University, Russian Academy of Sciences; Institute for Analytical Instrumentation, Russian Academy of Sciences; Ioffe Institute

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 190103; St. Petersburg, 194021

S. P. Lebedev

Ioffe Institute

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021

A. A. Lebedev

Ioffe Institute

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021

D. A. Kirilenko

Ioffe Institute

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021


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