Email this article Estimation of the efficiency of the introduction of a porous layer into a silicon-on-sapphire structure substrate to enhance the reliability of devices under irradiation
- Authors: Aleksandrov P.A.1, Baranova E.K.1, Budaragin V.V.1
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Affiliations:
- National Research Center “Kurchatov Institute,”
- Issue: Vol 50, No 8 (2016)
- Pages: 1107-1111
- Section: Fabrication, Treatment, and Testing of Materials and Structures
- URL: https://journals.rcsi.science/1063-7826/article/view/197733
- DOI: https://doi.org/10.1134/S1063782616080054
- ID: 197733
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Abstract
We investigate the efficiency of the introduction of a porous layer into the substrate of a silicon-onsapphire structure by the implantation of He ions to enhance the radiation resistance of devices. The properties of the introduced layer and its parameters affecting the concentration of minority charge carriers generated by irradiation are analyzed. The reported results of the analysis and calculations can be used to optimize He-ion implantation conditions during the formation of a porous layer.
About the authors
P. A. Aleksandrov
National Research Center “Kurchatov Institute,”
Author for correspondence.
Email: Alexandrov_PA@nrcki.ru
Russian Federation, Moscow, 123098
E. K. Baranova
National Research Center “Kurchatov Institute,”
Email: Alexandrov_PA@nrcki.ru
Russian Federation, Moscow, 123098
V. V. Budaragin
National Research Center “Kurchatov Institute,”
Email: Alexandrov_PA@nrcki.ru
Russian Federation, Moscow, 123098
