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On the Effect of the Crystal Structure in the Sputtering of Two-Component Single-Crystal Structures
Samoilov V.N., Ananieva N.G.
Effective sputtering yields of titanium, titanium nitride, and molybdenum induced by nitrogen ions and ions of nitrogen-oxygen mixtures
Dukhopel’nikov D.V., Riazanov V.A., Vorob’ev E.V., Abgarian V.K., Popov G.A., Khartov S.A.
A Comment on the Computer Simulation Program SRIM
Shulga V.I.
Simulation of the interaction of free Cu–Bi clusters with low-energy single atoms and clusters of argon
Shyrokorad D.V., Kornich G.V., Buga S.G.
On the Change in the Reflectance of Мо(111) Mirrors after Exposure to D2–N2 Plasma
Gorodetsky A.E., Bukhovets V.L., Markin A.V., Voytitsky V.L., Rybkina T.V., Zalavutdinov R.K., Zakharov A.P., Zolotarevsky V.I., Arkhipushkin I.A., Kazansky L.P.
Internal Stresses in Mo/Y Multilayer Mirrors
Kvashennikov D.S., Vainer Y.A., Zuev S.Y., Polkovnikov V.N.
Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Tashmukhamedova D.A., Yusupjanova M.B., Tashatov A.K., Umirzakov B.E.
Emission theory of amorphous-material sputtering. Energy dependence of the sputtering coefficient
Pustovit A.N.
Study into the properties of TiN/WN multilayer nanocoatings prepared via magnetron sputtering
Bodnarchuk V.I., Petrov P., Kozlenko D.P., Dechev D., Ivanov N., Martev I., Kasatkin I.A.
Modeling of cathode sputtering in a low-current gas discharge in a mixture of argon with mercury vapor
Kristya V.I., Savichkin D.O., Fisher M.R.
Diagnostics of the Elemental Composition of PZT Films on Platinum by X-Ray Microprobe Analysis
Beshenkov V.G., Znamenskii A.G., Marchenko V.A., Nekrasov A.N.
Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers
Zuyev S.Y., Pariev D.E., Pleshkov R.S., Polkovnikov V.N., Salashchenko N.N., Svechnikov M.V., Sertsu M.G., Sokolov A., Chkhalo N.I., Schäfers F.
Simulation of Redeposited Silicon Sputtering under Focused Ion Beam Irradiation
Borgardt N.I., Volkov R.L., Rumyantsev A.V.
Improvement in the homogeneity of molybdenium coatings deposited onto polished polycrystalline molybdenium substrates
Rogov A.V., Kapustin Y.V., Martynenko Y.V.
Comparison of the main parameters of the ion-photon emission of titanium atoms and singly charged ions
Afanasieva I.A., Bobkov V.V., Gritsyna V.V., Oksenyuk I.I., Shevchenko D.I.
Influence of surface corrugation on the sputtering of carbon materials under high-fluence ion bombardment
Andrianova N.N., Borisov A.M., Mashkova E.S., Shulga V.I.
Structural Changes in Nanoporous Silicon-Based Materials under Low-Energy Ion Impact
Sycheva A.A., Voronina E.N., Rakhimova T.V.
Monte Carlo Simulation of the Ion and Fast Atom Energy Spectra at the Cathode Surface in Low-Current Discharge in a Mixture of Argon with Mercury Vapor
Savichkin D.O., Kristya V.I.
On the Trapping and Retention of Hydrogen Isotopes in Graphite under Sequential Hydrogen Plasma Irradiation
Ayrapetov A.A., Begrambekov L.B., Dovganyuk S.S., Kaplevsky A.S.
Effect of concurrent electron irradiation on the structure of deposited carbon films
Korshunov S.N., Martynenko Y.V., Belova N.E., Skorlupkin I.D.
In-vitro dissolution and structural and electrokinetic characteristics of titanium-oxynitride coatings formed via reactive magnetron sputtering
Pichugin V.F., Pustovalova A.A., Konishchev M.E., Khlusov I.A., Ivanova N.M., Zhilei S., Gutor S.S.
Synthesis and Properties of Nanoscale Bismuth-Iron Garnet Films for Magnetoplasmonic Heterostructures
Naydenov P.N., Golikova O.L., Ketsko V.A., Chekhov A.L., Murzina T.V.
Comparative Analysis of the Effect of RF and DC Magnetron Sputtering Parameters on the Structure Formation of Tantalum-Diboride Thin Films
Goncharov A.A., Yunda A.N., Bazhin A.I., Shelest I.V., Buranich V.V.
Analysis of TiAlSiN coatings deposited by reactive magnetron sputtering under high-current ion assistance
Gavrilov N.V., Kamenetskikh A.S., Chukin A.V.
New carbon structures in annealed carbon–cadmium film coatings
Volodin V.N., Tuleushev Y.Z., Shabanova T.A., Sukurov B.M., Zhakanbaev E.A.
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