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On the Effect of the Crystal Structure in the Sputtering of Two-Component Single-Crystal Structures
Samoilov V.N., Ananieva N.G.
Effective sputtering yields of titanium, titanium nitride, and molybdenum induced by nitrogen ions and ions of nitrogen-oxygen mixtures
Dukhopel’nikov D.V., Riazanov V.A., Vorob’ev E.V., Abgarian V.K., Popov G.A., Khartov S.A.
A Comment on the Computer Simulation Program SRIM
Shulga V.I.
Simulation of the interaction of free Cu–Bi clusters with low-energy single atoms and clusters of argon
Shyrokorad D.V., Kornich G.V., Buga S.G.
Structural Changes in Nanoporous Silicon-Based Materials under Low-Energy Ion Impact
Sycheva A.A., Voronina E.N., Rakhimova T.V.
Monte Carlo Simulation of the Ion and Fast Atom Energy Spectra at the Cathode Surface in Low-Current Discharge in a Mixture of Argon with Mercury Vapor
Savichkin D.O., Kristya V.I.
On the Trapping and Retention of Hydrogen Isotopes in Graphite under Sequential Hydrogen Plasma Irradiation
Ayrapetov A.A., Begrambekov L.B., Dovganyuk S.S., Kaplevsky A.S.
Effect of concurrent electron irradiation on the structure of deposited carbon films
Korshunov S.N., Martynenko Y.V., Belova N.E., Skorlupkin I.D.
In-vitro dissolution and structural and electrokinetic characteristics of titanium-oxynitride coatings formed via reactive magnetron sputtering
Pichugin V.F., Pustovalova A.A., Konishchev M.E., Khlusov I.A., Ivanova N.M., Zhilei S., Gutor S.S.
Synthesis and Properties of Nanoscale Bismuth-Iron Garnet Films for Magnetoplasmonic Heterostructures
Naydenov P.N., Golikova O.L., Ketsko V.A., Chekhov A.L., Murzina T.V.
Comparative Analysis of the Effect of RF and DC Magnetron Sputtering Parameters on the Structure Formation of Tantalum-Diboride Thin Films
Goncharov A.A., Yunda A.N., Bazhin A.I., Shelest I.V., Buranich V.V.
Analysis of TiAlSiN coatings deposited by reactive magnetron sputtering under high-current ion assistance
Gavrilov N.V., Kamenetskikh A.S., Chukin A.V.
New carbon structures in annealed carbon–cadmium film coatings
Volodin V.N., Tuleushev Y.Z., Shabanova T.A., Sukurov B.M., Zhakanbaev E.A.
Blaze of Multilayer Diffraction Gratings in the Soft X-Ray Range: Growth Design Taking into Account the Deformation of Groove Profiles
Goray L.I., Lubov M.N.
Organization of the Post-Discharge Mode under Pulsed Ion-Plasma Treatment
Volpian O.D., Kuzmichev A.I., Tsybulsky L.Y.
Influence of annealing on the optical properties and chemical and phase compositions of tungsten-oxide films
Shapovalov V.I., Komlev A.E., Vit’ko V.V., Zav’yalov A.V., Lapshin A.E., Moshkalev S.A., Ermakov V.A.
Analysis of the Results of Silicon Sputtering Simulation as Functions of Different Ar–Si Potentials
Sycheva A.A., Voronina E.N., Palov A.P.
Structure Changes in Carbon Films Prepared by Electron-Beam-Assisted Deposition
Korshunov S.N., Lebedev A.M., Martynenko Y.V., Svechnikov N.Y., Skorlupkin I.D.
Molecular Dynamics Simulation of Physical Sputtering of Nanoporous Silicon-Based Materials with Low Energy Argon
Sycheva A.A., Voronina E.N., Rakhimova T.V.
Excitation Energies of VnOm+ and NbnOm+ Clusters Sputtered under Ion Bombardment
Dzhemilev N.K., Kovalenko S.F., Maksimov S.E., Tukfatullin O.F., Khojiev S.T.
Modeling of the glow discharge cathode sheath and the cathode surface sputtering in a mixture of argon with mercury vapor
Dubinina M.S., Savichkin D.O., Fisher M.R., Kristya V.I.
Low energy selective etching of metal films in oxygen-containing high-density argon plasma
Amirov I.I., Izyumov M.O., Naumov V.V.
Effect of Ion Bombardment on the Density of States of Valence Electrons in CdS Films
Umirzakov B.E., Tashmukhamedova D.A., Rabbimov E.M., Sodikjanov J.S., Urokov A.N.
Aperiodic Mirrors Based on Multilayer Beryllium Systems
Garakhin S.A., Zuev S.Y., Pleshkov R.S., Polkovnikov V.N., Salashchenko N.N., Chkhalo N.I.
Obtainment of Stabilized Zirconium Dioxide via the High-Frequency Magnetron Sputtering of a Metallic Target
Valyukhov S.G., Stognei O.V., Filatov M.S.
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