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Title
Authors
Vol 13, No 4 (2019)
On the Effect of the Crystal Structure in the Sputtering of Two-Component Single-Crystal Structures
Samoilov V.N., Ananieva N.G.
PDF
(Eng)
Vol 12, No 1 (2018)
Principles of the Construction and Computer Simulation of a Source of Homogeneous and Heterogeneous Cluster Ions
Belykh S.F., Bekkerman A.D., Tolstogouzov A.B., Lozovan A.A., Fu D.J.
PDF
(Eng)
Vol 13, No 3 (2019)
A Comment on the Computer Simulation Program SRIM
Shulga V.I.
PDF
(Eng)
Vol 11, No 3 (2017)
Simulation of the interaction of free Cu–Bi clusters with low-energy single atoms and clusters of argon
Shyrokorad D.V., Kornich G.V., Buga S.G.
PDF
(Eng)
Vol 10, No 6 (2016)
Effective sputtering yields of titanium, titanium nitride, and molybdenum induced by nitrogen ions and ions of nitrogen-oxygen mixtures
Dukhopel’nikov D.V., Riazanov V.A., Vorob’ev E.V., Abgarian V.K., Popov G.A., Khartov S.A.
PDF
(Eng)
Vol 12, No 1 (2018)
Excitation Energies of VnOm+ and NbnOm+ Clusters Sputtered under Ion Bombardment
Dzhemilev N.K., Kovalenko S.F., Maksimov S.E., Tukfatullin O.F., Khojiev S.T.
PDF
(Eng)
Vol 10, No 3 (2016)
Depth of origin of sputtered particles under the oblique incidence of a primary ion beam
Pustovit A.N.
PDF
(Eng)
Vol 10, No 2 (2016)
Modeling of cathode sputtering in a low-current gas discharge in a mixture of argon with mercury vapor
Kristya V.I., Savichkin D.O., Fisher M.R.
PDF
(Eng)
Vol 12, No 5 (2018)
Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Tashmukhamedova D.A., Yusupjanova M.B., Tashatov A.K., Umirzakov B.E.
PDF
(Eng)
Vol 11, No 2 (2017)
Pulsed magnetron sputtering and ion-induced annealing of carbon films
Shevchenko E.F., Sysoev I.A., Prucnal S., Frenzel K.
PDF
(Eng)
Vol 11, No 5 (2017)
Emission theory of amorphous-material sputtering. Energy dependence of the sputtering coefficient
Pustovit A.N.
PDF
(Eng)
Vol 11, No 3 (2017)
Modeling of the glow discharge cathode sheath and the cathode surface sputtering in a mixture of argon with mercury vapor
Dubinina M.S., Savichkin D.O., Fisher M.R., Kristya V.I.
PDF
(Eng)
Vol 12, No 3 (2018)
Simulation of Redeposited Silicon Sputtering under Focused Ion Beam Irradiation
Borgardt N.I., Volkov R.L., Rumyantsev A.V.
PDF
(Eng)
Vol 11, No 3 (2017)
Analysis of TiAlSiN coatings deposited by reactive magnetron sputtering under high-current ion assistance
Gavrilov N.V., Kamenetskikh A.S., Chukin A.V.
PDF
(Eng)
Vol 10, No 2 (2016)
Influence of surface corrugation on the sputtering of carbon materials under high-fluence ion bombardment
Andrianova N.N., Borisov A.M., Mashkova E.S., Shulga V.I.
PDF
(Eng)
Vol 13, No 1 (2019)
Monte Carlo Simulation of the Ion and Fast Atom Energy Spectra at the Cathode Surface in Low-Current Discharge in a Mixture of Argon with Mercury Vapor
Savichkin D.O., Kristya V.I.
PDF
(Eng)
Vol 12, No 3 (2018)
On the Trapping and Retention of Hydrogen Isotopes in Graphite under Sequential Hydrogen Plasma Irradiation
Ayrapetov A.A., Begrambekov L.B., Dovganyuk S.S., Kaplevsky A.S.
PDF
(Eng)
Vol 11, No 4 (2017)
Effect of concurrent electron irradiation on the structure of deposited carbon films
Korshunov S.N., Martynenko Y.V., Belova N.E., Skorlupkin I.D.
PDF
(Eng)
Vol 13, No 6 (2019)
Effect of Ion Bombardment on the Density of States of Valence Electrons in CdS Films
Umirzakov B.E., Tashmukhamedova D.A., Rabbimov E.M., Sodikjanov J.S., Urokov A.N.
PDF
(Eng)
Vol 13, No 2 (2019)
Structure Changes in Carbon Films Prepared by Electron-Beam-Assisted Deposition
Korshunov S.N., Lebedev A.M., Martynenko Y.V., Svechnikov N.Y., Skorlupkin I.D.
PDF
(Eng)
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