Analysis of TiAlSiN coatings deposited by reactive magnetron sputtering under high-current ion assistance

Abstract

TiAlSiN nanocomposite coatings are obtained by the reactive magnetron sputtering of one-component targets with a widely varying (5–25) ratio of the ion current density j_i to the atomic flux density j_n on the sample surface. The plasma in the deposition chamber is generated by a broad (80 cm²) low-energy (100 eV) electron beam. The beam current is varied from 5 to 30 A, which makes it possible to adjust j_i in the range of 1.8 to 9 mA/cm². It is shown that an increase in the ratio j_i/j_n is accompanied by a nonmonotonic variation in the hardness and texture of the coatings under the action of internal stresses. It is established that exceeding the value j_i/j_n at which the maximum hardness of the coating is reached (43 GPa) leads to the relaxation of intrinsic stresses and a reduction in the hardness to 36 GPa.