Editorial Policies
Aims and Scope
Journal is covers technological, physical and circuit engineering problems in micro- and nanoelectronics. Special emphasis on new trends in lithography (optical, x-ray, electron, ion), etching, impurity implantation, deposition and planarization in submicron and nanometer scale.
Sections
ДИАГНОСТИКА
QUANTUM TECHNOLOGIES
MODELING
ТЕХНОЛОГИИ
ИСКУССТВЕННЫЙ ИНТЕЛЛЕКТ
МОДЕЛИРОВАНИЕ ПРИБОРОВ
МОДЕЛИРОВАНИЕ ТЕХНОЛОГИЧЕСКИХ ПРОЦЕССОВ
LITHOGRAPHY
ПРИБОРЫ
ТЕХНОЛОГИИ
МЭМС–УСТРОЙСТВА
УСТРОЙСТВА
МОДЕЛИРОВАНИЕ ТЕХНОЛОГИЧЕСКИХ ПРОЦЕССОВ
НАДЕЖНОСТЬ
ПЛАЗМЕННЫЕ ТЕХНОЛОГИИ
MEMORY
СЕНСОРЫ
МЭМС-УСТРОЙСТВА
NEUROMORPHIC SYSTEMS
NANOSTRUCTURES
NANOTRANSISTORS
Publication Frequency
Periodicity: 6 issues a year.
Delayed Open Access
The contents of this journal will be available in an open access format 12 month(s) after an issue is published.
Indexing
Indexing:
- RSCI
- translated version in Scopus
- VAK