Nanoparticle Formation in Zn+ and O+ Ion Sequentially Implanted SiO2 Film
- 作者: Privezentsev V.1, Makunin A.2, Batrakov A.3, Ksenich S.4, Goryachev A.5
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隶属关系:
- Institute of Physics and Technology
- Skobeltsyn Institute of Nuclear Physics
- National Research University “MPEI”
- National Research University “MISiS”
- National Research University “MIET”
- 期: 卷 52, 编号 5 (2018)
- 页面: 645-650
- 栏目: XXV International Symposium “Nanostructures: Physics and Technology”, Saint Petersburg, Russia, June 26–30, 2017. Nanostructure Technology
- URL: https://journals.rcsi.science/1063-7826/article/view/203277
- DOI: https://doi.org/10.1134/S106378261805024X
- ID: 203277
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详细
The 64Zn+ and 16O+ ions were implanted in SiO2 film on Si substrate with next parameters: the implant dose was 5.0 × 1016 cm–2, for Zn+ ions the energy was 50 keV and for O+ ions the energy was 16 keV. Than the samples were subjected to isochronally during 1h annealing in N2 atmosphere in temperature range 400–600°C and than in Ar atmosphere in temperature range from 700 up to 1000°C with a step of 100°C. After annealing the samples surface is structured and its roughness increases due to nanoparticle formation in subsurface layer. In as implanted and in annealed samples on its surface and in its body the Zn-contained nanoparticles with a size about 100 nm were formed. These nanoparticles consist presumably from Zn phase after implantation and from ZnO phase after annealing.
作者简介
V. Privezentsev
Institute of Physics and Technology
编辑信件的主要联系方式.
Email: privezentsev@ftian.ru
俄罗斯联邦, Moscow, 117218
A. Makunin
Skobeltsyn Institute of Nuclear Physics
Email: privezentsev@ftian.ru
俄罗斯联邦, Moscow, 119991
A. Batrakov
National Research University “MPEI”
Email: privezentsev@ftian.ru
俄罗斯联邦, Moscow, 111250
S. Ksenich
National Research University “MISiS”
Email: privezentsev@ftian.ru
俄罗斯联邦, Moscow, 119049
A. Goryachev
National Research University “MIET”
Email: privezentsev@ftian.ru
俄罗斯联邦, Zelenograd, Moscow, 124420