Analysis of the impact of non-1D effects on the gate switch-on current in 4H-SiC thyristors


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The impact of non-1D effects caused by the spread of the gate current in the base layer on the gate switch-on current in 4H-SiC thyristors is considered. It is shown that a new switching mechanism implemented in 4H-SiC thyristors results in the dependence of the gate switch-on current on the thyristor parameters, with this dependence being fundamentally different from that in conventional silicon thyristors.

作者简介

S. Yurkov

All-Russia Electrotechnical Institute

Email: melev@nimis.ioffe.rssi.ru
俄罗斯联邦, Moscow, 111250

T. Mnatsakanov

All-Russia Electrotechnical Institute

Email: melev@nimis.ioffe.rssi.ru
俄罗斯联邦, Moscow, 111250

M. Levinshtein

Ioffe Physical–Technical Institute

编辑信件的主要联系方式.
Email: melev@nimis.ioffe.rssi.ru
俄罗斯联邦, St. Petersburg, 194021

A. Tandoev

All-Russia Electrotechnical Institute

Email: melev@nimis.ioffe.rssi.ru
俄罗斯联邦, Moscow, 111250

J. Palmour

Cree Inc.

Email: melev@nimis.ioffe.rssi.ru
美国, 4600 Silicon Dr., Durham, NC, 27703


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