Charge transfer in rectifying oxide heterostructures and oxide access elements in ReRAM


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详细

The main aspects of the synthesis and experimental research of oxide diode heterostructures are discussed with respect to their use as selector diodes, i.e., access elements in oxide resistive memory. It is shown that charge transfer in these materials differs significantly from the conduction mechanism in pn junctions based on conventional semiconductors (Si, Ge, AIII–BV), and the model should take into account the electronic properties of oxides, primarily the low carrier drift mobility. It is found that an increase in the forward current requires an oxide with a small band gap (<1.3 eV) in the heterostructure composition. Heterostructures with Zn, In–Zn (IZO), Ti, Ni, and Cu oxides are studied; it is found that the CuO–IZO heterojunction has the highest forward current density (104 A/cm2).

作者简介

G. Stefanovich

Petrozavodsk State University

Email: v.a.kuroptev@gmail.com
俄罗斯联邦, pr. Lenina 33, Republic of Karelia, Petrozavodsk, 185910

A. Pergament

Petrozavodsk State University

Email: v.a.kuroptev@gmail.com
俄罗斯联邦, pr. Lenina 33, Republic of Karelia, Petrozavodsk, 185910

P. Boriskov

Petrozavodsk State University

Email: v.a.kuroptev@gmail.com
俄罗斯联邦, pr. Lenina 33, Republic of Karelia, Petrozavodsk, 185910

V. Kuroptev

Petrozavodsk State University

编辑信件的主要联系方式.
Email: v.a.kuroptev@gmail.com
俄罗斯联邦, pr. Lenina 33, Republic of Karelia, Petrozavodsk, 185910

T. Stefanovich

Petrozavodsk State University

Email: v.a.kuroptev@gmail.com
俄罗斯联邦, pr. Lenina 33, Republic of Karelia, Petrozavodsk, 185910


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