Negative annealing in silicon after the implantation of high-energy sodium ions
- Авторы: Korol’ V.1, Zastavnoi A.1, Kudriavtsev Y.2, Asomoza R.2
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Учреждения:
- Institute of Physics
- Department Ingenieria Electrica–SEES
- Выпуск: Том 51, № 5 (2017)
- Страницы: 549-555
- Раздел: Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion)
- URL: https://journals.rcsi.science/1063-7826/article/view/199814
- DOI: https://doi.org/10.1134/S1063782617050141
- ID: 199814
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Аннотация
The implantation of sodium ions with an energy of 300 keV is carried out into high-resistivity p-Si. The annealing of defects at Tann = 350–450°C and related activation of atoms (the latter occurs at the “tail” of atom distribution) are described by a first-order reaction. At Tann = 450–525°C and irrespective of the ion dose, negative annealing is observed; this annealing is accompanied by an appreciable increase in the surface resistance ρs. According to estimations, the activation energy of this process amounts to ~2 eV. It is our opinion that the annealing is related to the precipitation of sodium donor atoms, which occurs at a depth exceeding by two–three times the projected range Rp of ions. The annealing of defects at Tann = 525–700°C, which leads to a further decrease in ρs, features an activation energy of ~2.1 eV. The hypothesis that the “tail” in the profiles of sodium atoms measured by secondary-ion mass spectroscopy is due to the diffusion of these atoms from the walls of the crater to its center is verified. It is shown that this process is not implemented since the profiles of sodium atoms measured at room temperature do not differ from those measured at–140°C.
Об авторах
V. Korol’
Institute of Physics
Автор, ответственный за переписку.
Email: vkorol@ctsnet.ru
Россия, Rostov-on Don, 344090
A. Zastavnoi
Institute of Physics
Email: vkorol@ctsnet.ru
Россия, Rostov-on Don, 344090
Yu. Kudriavtsev
Department Ingenieria Electrica–SEES
Email: vkorol@ctsnet.ru
Мексика, Mexico, 07360
R. Asomoza
Department Ingenieria Electrica–SEES
Email: vkorol@ctsnet.ru
Мексика, Mexico, 07360