Silicon Nanopillar Microarrays: Formation and Resonance Reflection of Light


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Abstract—The results of investigating the spectral characteristics of reflection from silicon nanopillar (Si NP) microarrays in the wavelength region from 400 to 1100 nm are presented. The Si nanopillars are formed by electron lithography on a negative resist with subsequent reactive ion etching. The Si nanopillars are etched through a resist mask and SiO2 100 nm thick. In the spectra of reflection from nanopillar microarrays, minima are observed, the position of which depends strongly on the Si nanopillar diameter.

Sobre autores

L. Basalaeva

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Autor responsável pela correspondência
Email: basalaeva@isp.nsc.ru
Rússia, Novosibirsk, 630090

Yu. Nastaushev

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Email: basalaeva@isp.nsc.ru
Rússia, Novosibirsk, 630090

F. Dultsev

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University

Email: basalaeva@isp.nsc.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

N. Kryzhanovskaya

St. Petersburg National Research Academic University, Russian Academy of Sciences

Email: basalaeva@isp.nsc.ru
Rússia, St. Petersburg, 194021

E. Moiseev

St. Petersburg National Research Academic University, Russian Academy of Sciences

Email: basalaeva@isp.nsc.ru
Rússia, St. Petersburg, 194021


Declaração de direitos autorais © Pleiades Publishing, Ltd., 2019

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