Properties of Semipolar GaN Grown on a Si(100) Substrate
- Authors: Bessolov V.N.1, Konenkova E.V.1, Orlova T.A.1, Rodin S.N.1, Seredova N.V.1, Solomnikova A.V.2, Shcheglov M.P.1, Kibalov D.S.3, Smirnov V.K.3
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Affiliations:
- Ioffe Institute
- St. Petersburg Electrotechnical University LETI
- Quantum Silicon OOO
- Issue: Vol 53, No 7 (2019)
- Pages: 989-992
- Section: Fabrication, Treatment, and Testing of Materials and Structures
- URL: https://journals.rcsi.science/1063-7826/article/view/206555
- DOI: https://doi.org/10.1134/S1063782619070054
- ID: 206555
Cite item
Abstract
Semipolar GaN layers synthesized on a nanostructured Si(100) substrate are studied. It is shown that using a Si(100) nanoprofile combined with SixNy nanostrips on top of nanostructures can yield, via metal-organic chemical-vapor deposition, GaN(10\(\bar {1}\)2) layers. An additional SiC buffer layer makes it possible to obtain GaN(10\(\bar {1}\)1) layers with a full-width at half-maximum of the diffraction-curve of ωθ ≈ 35′ arcmin. It is found that the luminescence properties of the semipolar layers are mostly due to basal plane stacking faults BSFS-I1, in contrast to polar layers in which these properties are mostly due to the recombination of excitons.
About the authors
V. N. Bessolov
Ioffe Institute
Author for correspondence.
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
E. V. Konenkova
Ioffe Institute
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
T. A. Orlova
Ioffe Institute
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
S. N. Rodin
Ioffe Institute
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
N. V. Seredova
Ioffe Institute
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
A. V. Solomnikova
St. Petersburg Electrotechnical University LETI
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 197022
M. P. Shcheglov
Ioffe Institute
Email: bes.triat@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
D. S. Kibalov
Quantum Silicon OOO
Email: bes.triat@mail.ioffe.ru
Russian Federation, Moscow, 105005
V. K. Smirnov
Quantum Silicon OOO
Email: bes.triat@mail.ioffe.ru
Russian Federation, Moscow, 105005