Simulation and Experimental Studies of Illumination Effects on the Current Transport of Nitridated GaAs Schottky Diode


Cite item

Full Text

Open Access Open Access
Restricted Access Access granted
Restricted Access Subscription Access

Abstract

In this paper, we studied the electrical characteristic of Schottky diodes based on gold contact on nitridated GaAs substrates. The used (100) GaAs substrate is n-type with concentration of Nd = 4.9 × 1015 cm–3. Nitridation process was performed using a N2 glow discharge source (GDS) creating N atomic species. A ultra-thin film with a thickness of 2.2 nm GaN is performed on GaAs surface. In order to study the electric characteristics under illumination, we use of a He–Ne laser of 1 mW power and 632.8 nm wavelength. The current–voltage (IV) of the Au/GaN/GaAs structures was investigated at room temperature. The saturation current IS, the series resistance RS and the mean ideality factor n are, respectively, equal to 4.46 × 10–07 A, 172 Ohm, 1.4 in the dark and to 5.64 × 10–07 A, 148 Ohm, 1.21 under illumination. To analyze these results, a 1D-simulation code of forward and reverse current–voltage characteristics versus the critical parameters of a nitridated GaAs Schottky diode is implemented. The algorithm is based on the solution of the system composed by Poisson’s and continuities equations. In this calculation, we take into account the existence of the GaN layer and the localization of traps states in the perturbed interface. We have considered the W-shaped and U-shaped distribution of traps states in the band gap. The effects of the doping concentration of GaAs, the traps states density, light intensities and the work function of gold \({{\phi }_{m}}\) are investigated. By fitting the experimental curve, we can deduce the values of the traps states and the exact value of the work function of gold, and consequently we validate the developed model.

About the authors

A. Rabehi

Laboratoire de Micro-électronique Appliquèe, Université Djillali Liabès de Sidi Bel Abbés,
; Departement d´électronique, Institut des sciences et des technologies, Centre universitaire de Tissemsilt

Author for correspondence.
Email: rab_ehi@hotmail.fr
Algeria, Sidi Bel Abbés, BP 8922000; Tissemsilt, 38000

L. Bideux

Institut Pascal, Université Clermont Auvergne, CNRS, SIGMA Clermont

Email: rab_ehi@hotmail.fr
France, Clermont-Ferrand, F-63000

B. Gruzza

Institut Pascal, Université Clermont Auvergne, CNRS, SIGMA Clermont

Email: rab_ehi@hotmail.fr
France, Clermont-Ferrand, F-63000

G. Monier

Institut Pascal, Université Clermont Auvergne, CNRS, SIGMA Clermont

Email: rab_ehi@hotmail.fr
France, Clermont-Ferrand, F-63000

A. Hatem-Kacha

Laboratoire de Micro-électronique Appliquèe, Université Djillali Liabès de Sidi Bel Abbés,

Email: rab_ehi@hotmail.fr
Algeria, Sidi Bel Abbés, BP 8922000

M. Guermoui

Unité de Recherche Appliquée en Energies Renouvelables, URAER, Centre de Développement des Energies Renouvelables, CDER

Email: rab_ehi@hotmail.fr
Algeria, Ghardaïa, 47133

A. Ziane

Laboratoire de Micro-électronique Appliquèe, Université Djillali Liabès de Sidi Bel Abbés,

Email: rab_ehi@hotmail.fr
Algeria, Sidi Bel Abbés, BP 8922000

B. Akkal

Laboratoire de Micro-électronique Appliquèe, Université Djillali Liabès de Sidi Bel Abbés,

Email: rab_ehi@hotmail.fr
Algeria, Sidi Bel Abbés, BP 8922000

Z. Benamara

Laboratoire de Micro-électronique Appliquèe, Université Djillali Liabès de Sidi Bel Abbés,

Email: rab_ehi@hotmail.fr
Algeria, Sidi Bel Abbés, BP 8922000

M. Amrani

Laboratoire de Micro-électronique Appliquèe, Université Djillali Liabès de Sidi Bel Abbés,

Email: rab_ehi@hotmail.fr
Algeria, Sidi Bel Abbés, BP 8922000

C. Robert-Goumet

Institut Pascal, Université Clermont Auvergne, CNRS, SIGMA Clermont

Email: rab_ehi@hotmail.fr
France, Clermont-Ferrand, F-63000


Copyright (c) 2018 Pleiades Publishing, Ltd.

This website uses cookies

You consent to our cookies if you continue to use our website.

About Cookies