Behavioral Features of MIS Memristors with a Si3N4 Nanolayer Fabricated on a Conductive Si Substrate
- Authors: Tikhov S.V.1, Gorshkov O.N.1, Antonov I.N.1, Tetelbaum D.I.1, Mikhaylov A.N.1, Belov A.I.1, Morozov A.I.1, Karakolis P.2,3, Dimitrakis P.2
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Affiliations:
- Lobachevsky State University of Nizhny Novgorod
- Institute of Nanoscience and Nanotechnology, NCSR “Demokritos”
- Department of Physics, University of Patras
- Issue: Vol 52, No 12 (2018)
- Pages: 1540-1546
- Section: Xxii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 12–15, 2018
- URL: https://journals.rcsi.science/1063-7826/article/view/204675
- DOI: https://doi.org/10.1134/S1063782618120242
- ID: 204675
Cite item
Abstract
The effect of the material of the metal plates (Au, Ta, W) and exposure to a high-power blue laser on the memristive characteristics of metal–insulator–semiconductor (MIS) capacitors with a Si3N4 film 6 nm thick fabricated on the basis of n+-Si is studied. It is shown that bipolar switching by the current appears only in capacitors with Au. The causes of the absence of bipolar switching in capacitors with Ta and W are explained. The switching of capacitors with Ta by the current and light and the photomemory effect are detected. It is shown that, despite the high doping level of the semiconductor substrate, it decreases the MIS memristor response rate due to a high density of surface states localized at the Si3N4/n+-Si interface. However, illumination allows a significant increase in the response rate due to a decrease in the semiconductor resistivity. The surface state densities are determined. To improve the frequency characteristics of MIS memristors, it is necessary to achieve a low surface state density.
About the authors
S. V. Tikhov
Lobachevsky State University of Nizhny Novgorod
Author for correspondence.
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
O. N. Gorshkov
Lobachevsky State University of Nizhny Novgorod
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
I. N. Antonov
Lobachevsky State University of Nizhny Novgorod
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
D. I. Tetelbaum
Lobachevsky State University of Nizhny Novgorod
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
A. N. Mikhaylov
Lobachevsky State University of Nizhny Novgorod
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
A. I. Belov
Lobachevsky State University of Nizhny Novgorod
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
A. I. Morozov
Lobachevsky State University of Nizhny Novgorod
Email: tikhov@phys.unn.ru
Russian Federation, pr. Gagarina 23, Nizhny Novgorod, 603950
P. Karakolis
Institute of Nanoscience and Nanotechnology, NCSR “Demokritos”; Department of Physics, University of Patras
Email: tikhov@phys.unn.ru
Greece, Agia Paraskevi, 15341; Patras, GR, 26500
P. Dimitrakis
Institute of Nanoscience and Nanotechnology, NCSR “Demokritos”
Email: tikhov@phys.unn.ru
Greece, Agia Paraskevi, 15341