Pulsed laser deposition of AlxGa1–xAs and GaP thin films onto Si substrates for photoelectric converters


Cite item

Full Text

Open Access Open Access
Restricted Access Access granted
Restricted Access Subscription Access

Abstract

Pulsed laser deposition is used to produce AlGaAs and GaP thin films (with a thickness of less than 1 μm) on Si substrates. Methods for reducing the number of structural defects in the films are analyzed, and the effect of strains upon AlGaAs/Si and GaP/Si heterostructures is established by Raman spectroscopy. The application of Al0.3Ga0.7As and GaP films as wide-gap windows of silicon photoelectric converters is examined. The spectral characteristics of photocells based on Al0.3Ga0.7As/Si and GaP/Si heterostructures are studied. The heterostructures can be used as the first pn junction of a Si-based multijunction photoelectric converter.

About the authors

L. S. Lunin

Southern Scientific Center of Russian Academy of Sciences; Platov South-Russian State Polytechnic University (NPI)

Author for correspondence.
Email: lunin_ls@mail.ru
Russian Federation, Rostov-on-Don, 344006; Novocherkassk, 346428

M. L. Lunina

Southern Scientific Center of Russian Academy of Sciences

Email: lunin_ls@mail.ru
Russian Federation, Rostov-on-Don, 344006

O. V. Devitsky

North-Caucasus Federal University

Email: lunin_ls@mail.ru
Russian Federation, Stavropol, 355029

I. A. Sysoev

North-Caucasus Federal University

Email: lunin_ls@mail.ru
Russian Federation, Stavropol, 355029


Copyright (c) 2017 Pleiades Publishing, Ltd.

This website uses cookies

You consent to our cookies if you continue to use our website.

About Cookies