High-Voltage Silicon-Carbide Thyristor with an n-type Blocking Base
- Authors: Levinshtein M.E.1, Mnatsakanov T.T.2, Yurkov S.N.2, Tandoev A.G.2, Ryu S.3, Palmour J.W.3
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Affiliations:
- Ioffe Physical–Technical Institute
- All-Russia Electrotechnical Institute
- Cree Inc., 4600 Silicon Dr.
- Issue: Vol 50, No 3 (2016)
- Pages: 404-410
- Section: Physics of Semiconductor Devices
- URL: https://journals.rcsi.science/1063-7826/article/view/196926
- DOI: https://doi.org/10.1134/S1063782616030155
- ID: 196926
Cite item
Abstract
The possibility of creating a high-voltage SiC thyristor with an n-type blocking base is analyzed. It is shown that a thyristor structure fabricated as an “analog” of a modern thyristor structure with a p-type blocking base, i.e., with the same layer thicknesses and replaced doping types (donors instead of acceptors, and vice versa), cannot be turned-on at any input signal level. At room temperature, a structure with an n-type blocking base and acceptable parameters can only be obtained in the absence of a stop layer. In this case, however, the maximum blocking voltage is approximately two times lower than that for a thyristor with a p-type blocking base of the same thickness. In the presence of a stop layer, a portion of an S-shaped negative differential resistance appears at room temperature in the forward current–voltage characteristic of the thyristor with an n-type blocking base. This effect is due to the violation and subsequent restoration of neutrality. At ambient temperatures of T ≥ 150°C, the current–voltage characteristics of the thyristor with the n-type blocking base become quite acceptable even in the presence of a stop layer.
About the authors
M. E. Levinshtein
Ioffe Physical–Technical Institute
Author for correspondence.
Email: melev@nimis.ioffe.ru
Russian Federation, St. Petersburg, 194021
T. T. Mnatsakanov
All-Russia Electrotechnical Institute
Email: melev@nimis.ioffe.ru
Russian Federation, Moscow, 111250
S. N. Yurkov
All-Russia Electrotechnical Institute
Email: melev@nimis.ioffe.ru
Russian Federation, Moscow, 111250
A. G. Tandoev
All-Russia Electrotechnical Institute
Email: melev@nimis.ioffe.ru
Russian Federation, Moscow, 111250
Sei-Hyung Ryu
Cree Inc., 4600 Silicon Dr.
Email: melev@nimis.ioffe.ru
United States, Durham, NC, 27703
J. W. Palmour
Cree Inc., 4600 Silicon Dr.
Email: melev@nimis.ioffe.ru
United States, Durham, NC, 27703