On Measurements of the Electrons and Holes Impact-Ionization Coefficients in 4H–SiC
- Authors: Kyuregyan A.S.1
-
Affiliations:
- All-Russia Electrical Engineering Institute
- Issue: Vol 50, No 3 (2016)
- Pages: 289-294
- Section: Electronic Properties of Semiconductors
- URL: https://journals.rcsi.science/1063-7826/article/view/196853
- DOI: https://doi.org/10.1134/S1063782616030143
- ID: 196853
Cite item
Abstract
All published results of measurements (at 300 K) of the impact ionization coefficients for electrons αn and holes αp in 4H–SiC are analyzed. It is shown that the most plausible approximations of dependences of αn, p on electric-field strength E have the usual form αn, p = an, p exp(–En, p/E) at fitting-parameter values of an = 38.6 × 106 cm–1, En = 25.6 MV/cm, ap = 5.31 × 106 cm–1, and Ep = 13.1 MV/cm. These dependences αn, p(E) are used to calculate the highest field strength Eb and thickness wb of the space-charge region at the breakdown voltage Ub. A number of new formulas for calculating αn, p(E) are obtained from the results of measuring the avalanche-multiplication coefficients and the excess-noise factors under the single-sided illumination of photodiodes with stepped doping.
About the authors
A. S. Kyuregyan
All-Russia Electrical Engineering Institute
Author for correspondence.
Email: semlab@yandex.ru
Russian Federation, Moscow, 111250