Informaçao sobre o Autor

Murin, D. B.

Edição	Seção	Título	Arquivo
Volume 45, Nº 5 (2016)	Article	Kinetics of the interaction between a CCl₂F₂ radio-frequency discharge and gallium arsenide
Volume 46, Nº 4 (2017)	Article	Copper etching kinetics in a high-frequency discharge of freon R12
Volume 47, Nº 2 (2018)	Article	Electrophysical Parameters and Radiation Spectra of Boron Trichloride Plasma
Volume 47, Nº 4 (2018)	Article	Structuring Copper in the Plasma Medium of a High-Frequency Discharge
Volume 47, Nº 4 (2018)	Article	On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF₄ + C₄F₈ + Ar Mixture on the Parameters of Plasma and SiO₂/Si Etching Selectivity
Volume 47, Nº 6 (2018)	Article	Parameters of Plasma and Kinetics of Active Particles in CF₄ (CHF₃) + Ar Mixtures of a Variable Initial Composition
Volume 47, Nº 6 (2018)	Article	Etching of GaAs in the Plasma of a Freon R-12–Argon (CCl₂F₂/Ar) Mixture
Volume 48, Nº 2 (2019)	Article	Features of the Kinetics of Bulk and Heterogeneous Processes in CHF₃ + Ar and C₄F₈ + Ar Plasma Mixtures
Volume 48, Nº 6 (2019)	Article	Parameters of Plasma and Way of Etching Silicon in a CF₄ + CHF₃ + O₂ Mixture