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Vol 47, No 2 (2018)

Article

Generation and Concentration of Terahertz Radiation in a Microcavity with an Open Quantum Dot

Tsukanov A.V., Kateev I.Y.

Abstract

A scheme to generate terahertz radiation by an array of quantum dots localized at the center of a semiconducting heterostructure is developed. Electrons are injected into the active part due to the source and drain Fermi energy difference induced by a dc electric field. The structure is placed inside a microcavity stimulating the electronic transition in the quantum dots accompanied by the emission of a photon to the cavity mode. This process is optimized using the filters formed by the quantum wells, which facilitate the electron density concentration in a quantum dot. The electromagnetic field radiated by the cavity in the waveguide can be used for a local effect on the charge qubits. The parameters of such a source depend on the working characteristics of the quantum dots and cavity.

Russian Microelectronics. 2018;47(2):83-94
pages 83-94 views

Electrophysical Parameters and Radiation Spectra of Boron Trichloride Plasma

Murin D.B., Dunaev A.V.

Abstract

The electrophysical parameters and radiation spectrum of BCl3 plasma under a DC glow discharge are analyzed. Data on the gas temperature and reduced electrical field intensity are obtained. It is established that the reduced electrical field intensity in BCl3 plasma practically does not depend on the discharge current (under a constant pressure); moreover, it appreciably decreases with an increase in the gas pressure (under a constant discharge current). It is revealed that a linear increase in the gas temperature with increasing pressure is caused by increasing the specific power expended in the discharge. The radiation spectra of BCl3 plasma are presented by atomic and molecular components. It is established that with a growth in the current the radiation intensity increases linearly, which corresponds to the mechanism of direct excitation of radiating states under an electronic impact and it is evidence of a lack of secondary processes.

Russian Microelectronics. 2018;47(2):95-103
pages 95-103 views

Field Emission Properties of Nanostructured Silicon Cathode Arrays

Yafarov R.K., Suzdaltsev S.Y., Shanygin V.Y.

Abstract

The fabrication method of field electron sources using the atomic structure of silicon crystals and the processes of heterophase vacuum-plasma self-organization of island carbon coatings and highly anisotropic plasma-chemical etching under low adsorption is theoretically justified and experimentally implemented. The interrelation of the morphological and field emission characteristics of fabricated field emission cathodic microstructures is established. The experimental results are interpreted using the Fowler-Nordheim representation in connection with the changes of the surface phases of multipoint silicon microstructures.

Russian Microelectronics. 2018;47(2):104-111
pages 104-111 views

Influence of Technological Modes on the Electrophysical Properties of Films of Polyacrylonitrile Doped with Metal Particles

Bednaya T.A., Konovalenko S.P.

Abstract

The electrophysical properties of the films of metal-containing polyacrylonitrile doped with Co, Cu, and Ag metals are investigated. The surface layers of the substrates are studied by the atomic force microscopy method. The thickness of the films of metal-containing polyacrylonitrile and the activation energy of the film conductivity are defined. It is revealed that the introduction of various doping elements with different concentrations makes it possible to obtain materials with different physical properties.

Russian Microelectronics. 2018;47(2):112-117
pages 112-117 views

Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia

Abdulagatov A.I., Ramazanov S.M., Dallaev R.S., Murliev E.K., Palchaev D.K., Rabadanov M.K., Abdulagatov I.M.

Abstract

Aluminum nitride (AlNx) films were obtained by atomic layer deposition (ALD) using tris(diethylamido) aluminum(III) (TDEAA) and hydrazine (N2H4) or ammonia (NH3). The quartz crystal microbalance (QCM) data showed that the surface reactions of TDEAA and N2H4 (or NH3) at temperatures from 150 to 225°C were self-limiting. The rates of deposition of the nitride film at 200°C for systems with N2H4 and NH3 coincided: ~1.1 Å/cycle. The ALD AlN films obtained at 200°C using hydrazine had higher density (2.36 g/cm3, 72.4% of bulk density) than those obtained with ammonia (2.22 g/cm3, 68%). The elemental analysis of the film deposited using TDEAA/N2H4 at 200°C showed the presence of carbon (~1.4 at %), oxygen (~3.2 at %), and hydrogen (22.6 at %) impurities. The N/Al atomic concentration ratio was ~1.3. The residual impurity content in the case of N2H4 was lower than for NH3. In general, it was confirmed that hydrazine has a more preferable surface thermochemistry than ammonia.

Russian Microelectronics. 2018;47(2):118-130
pages 118-130 views

Schottky Barrier Infra-Red Sensors Sensitive to Radiation of Quantum Energy Higher Than the Potential Barrier Height

Kerimov E.A., Kazymov N.F., Musaeva S.N.

Abstract

The technology to obtain a silicide Pt/Ir mixture and Pt/Ir–Si photosensitive structures with a Schottky barrier in the middle IR area is developed. It is found that the main way to detect Pt/IrSi–р–Si structures is through the photoemission of Pt/IrSi holes into silicon. Moreover, the maximal photosensitivity is observed when the Pt/IrSi is not thicker than the free path length of the holes (less than 460 Å). The energy band diagram of the Schottky barrier structures based on the Pt/IrSi–Si contact is plotted. It is determined that the electron affinity of Pt/IrSi varies within 4.7–5.26 eV depending on the operational conditions of its formation.

Russian Microelectronics. 2018;47(2):131-136
pages 131-136 views

Frequency Characteristics of GaN Field-Effect Transistors with Traps in the Barrier Layer

Aleshin A.N., Zenchenko N.V., Ponomarev D.S., Ruban O.A.

Abstract

This paper presents a modified nonlinear model of the Fujii transistor that incorporates the gate capacitance values obtained by capacitance-voltage measurements. It is shown that the proposed model allows us to correctly determine the operating frequency of the transistor, taking into account the effect of charged dislocation lines in the barrier layer of the heterostructure. The operating frequency values obtained with this modified model are in good agreement with the measured values.

Russian Microelectronics. 2018;47(2):137-141
pages 137-141 views

The Element of Matching on an STG DICE Cell for an Upset Tolerant Content Addressable Memory

Katunin Y.V., Stenin V.Y.

Abstract

The TCAD simulation of charge collection from tracks of single nuclear particles directed along the normal to the logic matching element on STG DICE cells demonstrates their unique upset tolerance. The tracks used for simulation are directed normal to the microchip surface with the linear energy transfer (LET) ranging from 10 to 60 MeV cm2/mg. We investigate a 65-nm bulk CMOS logic matching element for use in content addressable memory and translation lookaside buffers. It is a matching element on an STG DICE cell with an exclusive OR logic element on two tristate inverters. The linear energy transfers in the range of 30–60 MeV cm2/mg on the tracks normal to the chip surface do not cause single event upsets in the STG DICE cell for LET = 60 MeV cm2/mg. In the output combinational logic of the matching element, short (up to 0.6 ns) noise voltage pulses for a LET ranging from 20 to 60 MeV cm2/mg can be found.

Russian Microelectronics. 2018;47(2):142-156
pages 142-156 views

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