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Vol 13, No 4 (2019)
On the Effect of the Crystal Structure in the Sputtering of Two-Component Single-Crystal Structures
Samoilov V.N., Ananieva N.G.
PDF
(Eng)
Vol 10, No 6 (2016)
Effective sputtering yields of titanium, titanium nitride, and molybdenum induced by nitrogen ions and ions of nitrogen-oxygen mixtures
Dukhopel’nikov D.V., Riazanov V.A., Vorob’ev E.V., Abgarian V.K., Popov G.A., Khartov S.A.
PDF
(Eng)
Vol 13, No 3 (2019)
A Comment on the Computer Simulation Program SRIM
Shulga V.I.
PDF
(Eng)
Vol 11, No 3 (2017)
Simulation of the interaction of free Cu–Bi clusters with low-energy single atoms and clusters of argon
Shyrokorad D.V., Kornich G.V., Buga S.G.
PDF
(Eng)
Vol 13, No 6 (2019)
Analysis of the Results of Silicon Sputtering Simulation as Functions of Different Ar–Si Potentials
Sycheva A.A., Voronina E.N., Palov A.P.
PDF
(Eng)
Vol 13, No 2 (2019)
Structure Changes in Carbon Films Prepared by Electron-Beam-Assisted Deposition
Korshunov S.N., Lebedev A.M., Martynenko Y.V., Svechnikov N.Y., Skorlupkin I.D.
PDF
(Eng)
Vol 12, No 6 (2018)
Molecular Dynamics Simulation of Physical Sputtering of Nanoporous Silicon-Based Materials with Low Energy Argon
Sycheva A.A., Voronina E.N., Rakhimova T.V.
PDF
(Eng)
Vol 12, No 1 (2018)
Excitation Energies of VnOm+ and NbnOm+ Clusters Sputtered under Ion Bombardment
Dzhemilev N.K., Kovalenko S.F., Maksimov S.E., Tukfatullin O.F., Khojiev S.T.
PDF
(Eng)
Vol 11, No 3 (2017)
Modeling of the glow discharge cathode sheath and the cathode surface sputtering in a mixture of argon with mercury vapor
Dubinina M.S., Savichkin D.O., Fisher M.R., Kristya V.I.
PDF
(Eng)
Vol 10, No 4 (2016)
Low energy selective etching of metal films in oxygen-containing high-density argon plasma
Amirov I.I., Izyumov M.O., Naumov V.V.
PDF
(Eng)
Vol 13, No 6 (2019)
Effect of Ion Bombardment on the Density of States of Valence Electrons in CdS Films
Umirzakov B.E., Tashmukhamedova D.A., Rabbimov E.M., Sodikjanov J.S., Urokov A.N.
PDF
(Eng)
Vol 13, No 2 (2019)
Aperiodic Mirrors Based on Multilayer Beryllium Systems
Garakhin S.A., Zuev S.Y., Pleshkov R.S., Polkovnikov V.N., Salashchenko N.N., Chkhalo N.I.
PDF
(Eng)
Vol 12, No 6 (2018)
Obtainment of Stabilized Zirconium Dioxide via the High-Frequency Magnetron Sputtering of a Metallic Target
Valyukhov S.G., Stognei O.V., Filatov M.S.
PDF
(Eng)
Vol 12, No 1 (2018)
Principles of the Construction and Computer Simulation of a Source of Homogeneous and Heterogeneous Cluster Ions
Belykh S.F., Bekkerman A.D., Tolstogouzov A.B., Lozovan A.A., Fu D.J.
PDF
(Eng)
Vol 11, No 2 (2017)
Pulsed magnetron sputtering and ion-induced annealing of carbon films
Shevchenko E.F., Sysoev I.A., Prucnal S., Frenzel K.
PDF
(Eng)
Vol 10, No 4 (2016)
The effect of silicon-substrate orientation on the local piezoelectric characteristics of LiNbO3 films
Kiselev D.A., Zhukov R.N., Ksenich S.V., Kubasov I.V., Temirov A.A., Timushkin N.G., Bykov A.S., Malinkovich M.D., Shvartsman V.V., Lupascu D.C., Parkhomenko Y.N.
PDF
(Eng)
Vol 13, No 6 (2019)
Application of Ion-Beam Treatment in the Process of the Magnetron Deposition of Thin SnO2 Films
Alalykin A.S., Krylov P.N., Zakirova R.M., Fedotova I.V., Kostenkov N.V., Durman E.A.
PDF
(Eng)
Vol 13, No 2 (2019)
Sputtering of Silicon Single Crystals under Irradiation with a Helium and Argon Ion Beam with an Average Energy of 1 keV
Volkov N.V., Safonov D.A.
PDF
(Eng)
Vol 12, No 5 (2018)
Emission Theory of Amorphous Material Sputtering: the Dependence of the Sputtering Coefficient on the Angle of Primary Ion Beam Incidence
Pustovit A.N.
PDF
(Eng)
Vol 11, No 5 (2017)
Synergetics of surface sputtering by polyatomic ions
Oksengendler B.L., Maksimov S.E., Nikiforov V.N., Turaev N.Y.
PDF
(Eng)
Vol 11, No 1 (2017)
On enhancing the thermal stability of metal hydrides by ion–plasma vacuum magnetron sputtering
Pavlenko V.I., Cherkashina N.I., Yastrebinsky R.N., Demchenko O.V.
PDF
(Eng)
Vol 10, No 3 (2016)
Depth of origin of sputtered particles under the oblique incidence of a primary ion beam
Pustovit A.N.
PDF
(Eng)
Vol 13, No 6 (2019)
On the Change in the Reflectance of Мо(111) Mirrors after Exposure to D2–N2 Plasma
Gorodetsky A.E., Bukhovets V.L., Markin A.V., Voytitsky V.L., Rybkina T.V., Zalavutdinov R.K., Zakharov A.P., Zolotarevsky V.I., Arkhipushkin I.A., Kazansky L.P.
PDF
(Eng)
Vol 13, No 2 (2019)
Internal Stresses in Mo/Y Multilayer Mirrors
Kvashennikov D.S., Vainer Y.A., Zuev S.Y., Polkovnikov V.N.
PDF
(Eng)
Vol 12, No 5 (2018)
Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Tashmukhamedova D.A., Yusupjanova M.B., Tashatov A.K., Umirzakov B.E.
PDF
(Eng)
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