电邮这篇文章 Exposure kinetics of a positive photoresist layer on an optically matched substrate
- 作者: Kudrya V.P.1
-
隶属关系:
- NRC “Kurchatov Institute”
- 期: 卷 54, 编号 1 (2025)
- 页面: 19-25
- 栏目: МОДЕЛИРОВАНИЕ
- URL: https://journals.rcsi.science/0544-1269/article/view/294481
- DOI: https://doi.org/10.31857/S0544126925010034
- EDN: https://elibrary.ru/GIKWRO
- ID: 294481
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A number of works devoted to modeling the exposure process of a photoactive layer lying on an optically matched substrate is analyzed. The relationship between Dill's equations and previously obtained systems of equations is shown. Methods for reducing the system of two Dill's partial differential equations to ordinary differential equations, the accuracy of the numerical solution of which can be easily controlled, are considered sequentially. A procedure for using such equations to characterize the photochemical properties of positive photoresists is proposed.
全文:
作者简介
V. Kudrya
NRC “Kurchatov Institute”
编辑信件的主要联系方式.
Email: kvp@ftian.ru
Физико-технологический институт им. К.А. Валиева РАН
俄罗斯联邦, Moscow参考
- VLSI Technology. Edited by S.M. Sze. McGraw-Hill Book Company. USA 654, 1983, ISBN: 978-0070626867.
- Wegscheider R. Beiträge zur photochemischen Kinetik // Zeitschrift für Physikalische Chemie. 1922. V. 103. No 1. P. 273–306. https://doi.org/10.1515/zpch-1922-10318
- Herrick C.E. The Sensitometry of the Positive Diazotype Process // Journal of the Optical Society of America. 1952. V. 42. No 12. P. 904–910. https://doi.org/10.1364/JOSA.42.000904
- Herrick C.E. Solution of the Partial Differential Equations Describing Photodecomposition in a Light-absorbing Matrix having Light-absorbing Photoproducts // IBM Journal of Research and Development. 1966. V. 10. No 1. P. 2–5. https://doi.org/10.1147/rd.101.0002
- Dill F.H., Neureuther A.R. Machining integrated optical structures in photoresist // IEEE Transactions on Electron Devices. 1973. V. 20. No 12. P. 1173–1173. https://doi.org/10.1109/T-ED.1973.17826
- Neureuther A.R., Dill F.H. Photoresist modeling and device fabrication applications // Proceedings of the Symposium on Optical and Acoustical Microelectronics. Microwave Research Institute Symposia Series. 1975. V. 18. P. 233–249.
- Dill F.H., Hornberger W.P., Hauge P.S., Shaw J.M. Characterization of positive photoresist // IEEE Transactions on Electron Devices. 1975. V. 22. No 7. P. 445–452. https://doi.org/10.1109/T-ED.1975.18159
- Dill F.H., Neureuther A.R., Tuttle J.A., Walker E.J. Modeling Projection Printing of Positive Photoresists // IEEE Transactions on Electron Devices. 1975. V. 22. No 7. P. 456–464. https://doi.org/10.1109/T-ED.1975.18161
- Arushanyan O.B., Zaletkin S.F. Chislennoe reshenie obyknovennykh differentsial’nykh uravnenii na Fortrane. MSU Press, RF 336, 1990, ISBN: 5-211-00957-6 (in Russian).
- Dill F.H., Tuttle J.A., Neureuther A.R. Limits of optical lithography // International Electron Devices Meeting. 1974. P. 13–16. https://doi.org/10.1109/IEDM.1974.6219620
- Hamming R.W. Numerical Methods for Scientists and Engineers. McGraw-Hill Book Company. USA 432, 1962. ISBN: 978-0070258860
- Krasnov M.L. Obyknovennye differencial’nye uravnenija. Vysshaja Shkola. USSR 128, 1983 (in Russian).
