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Exposure kinetics of a positive photoresist layer on an optically matched substrate
- Authors: Kudrya V.P.1
-
Affiliations:
- NRC “Kurchatov Institute”
- Issue: Vol 54, No 1 (2025)
- Pages: 19-25
- Section: МОДЕЛИРОВАНИЕ
- URL: https://journals.rcsi.science/0544-1269/article/view/294481
- DOI: https://doi.org/10.31857/S0544126925010034
- EDN: https://elibrary.ru/GIKWRO
- ID: 294481
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Abstract
A number of works devoted to modeling the exposure process of a photoactive layer lying on an optically matched substrate is analyzed. The relationship between Dill's equations and previously obtained systems of equations is shown. Methods for reducing the system of two Dill's partial differential equations to ordinary differential equations, the accuracy of the numerical solution of which can be easily controlled, are considered sequentially. A procedure for using such equations to characterize the photochemical properties of positive photoresists is proposed.
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About the authors
V. P. Kudrya
NRC “Kurchatov Institute”
Author for correspondence.
Email: kvp@ftian.ru
Физико-технологический институт им. К.А. Валиева РАН
Russian Federation, MoscowReferences
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