Enviar artigo por via de e-mail Exposure kinetics of a positive photoresist layer on an optically matched substrate
- Autores: Kudrya V.P.1
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Afiliações:
- NRC “Kurchatov Institute”
- Edição: Volume 54, Nº 1 (2025)
- Páginas: 19-25
- Seção: МОДЕЛИРОВАНИЕ
- URL: https://journals.rcsi.science/0544-1269/article/view/294481
- DOI: https://doi.org/10.31857/S0544126925010034
- EDN: https://elibrary.ru/GIKWRO
- ID: 294481
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Resumo
A number of works devoted to modeling the exposure process of a photoactive layer lying on an optically matched substrate is analyzed. The relationship between Dill's equations and previously obtained systems of equations is shown. Methods for reducing the system of two Dill's partial differential equations to ordinary differential equations, the accuracy of the numerical solution of which can be easily controlled, are considered sequentially. A procedure for using such equations to characterize the photochemical properties of positive photoresists is proposed.
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Sobre autores
V. Kudrya
NRC “Kurchatov Institute”
Autor responsável pela correspondência
Email: kvp@ftian.ru
Физико-технологический институт им. К.А. Валиева РАН
Rússia, MoscowBibliografia
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